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Bernhard Geuppert

Carl Zeiss AG

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Publication

Featured researches published by Bernhard Geuppert.

Archive | 2005

Exposure apparatus and measuring device for a projection lens

Albrecht Ehrmann; Ulrich Wegmann; Rainer Hoch; Joerg Mallmann; Karl-Heinz Schuster; Ulrich Loering; Toralf Gruner; Bernhard Kneer; Bernhard Geuppert; Franz Sorg; Jens Kugler; Norbert Wabra

Archive | 2004

Collector with fastening devices for fastening mirror shells

Wolfgang Singer; Wilhelm Egle; Markus Weiss; Joachim Hainz; Joachim Wietzorrek; Johannes Wangler; Frank Melzer; Bernhard Gellrich; Bernhard Geuppert; Erich Schubert; Martin Antoni

Archive | 2009

Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations

Guido Limbach; Franz Sorg; Armin Schoeppach; Ulrich Weber; Ulrich Loering; Dirk Hellweg; Peter Meyer; Stefan Xalter; Jens Kugler; Bernhard Gellrich; Stefan Hembacher; Bernhard Geuppert; Aksel Goehnermeier

Archive | 2010

Projection exposure system for microlithography with a measurement device

Ulrich Mueller; Joachim Stuehler; Oswald Gromer; Rolf Freimann; Paul Kaufmann; Bernhard Geuppert

Archive | 2008

Microlithographic projection exposure apparatus and measuring device for a projection lens

Albrecht Ehrmann; Ulrich Wegmann; Rainer Hoch; Joerg Mallmann; Karl-Heinz Schuster; Ulrich Loering; Toralf Gruner; Bernhard Kneer; Bernhard Geuppert; Franz Sorg; Jens Kugler; Norbert Wabra

Archive | 2006

Vibration damping for photolithographic lens mount

Bernhard Geuppert; Leonhard Soell

Archive | 2009

Projection exposure apparatus and optical system

Sascha Bleidistel; Bernhard Geuppert

Archive | 2006

Lithographic apparatus, device manufacturing method and exchangeable optical element

Erik Roelof Loopstra; Adrianus Franciscus Petrus Engelen; Bernardus Antonius Johannes Luttikhuis; Maria Johanna Agnes Rubingh; Johannes Martinus Andreas Hazenberg; Laurentius Catrinus Jorritsma; Johannes Wilhelmus De Klerk; Bernhard Geuppert; Aart Adrianus Van Beuzekom; Petrus Franciscus Wilhelmus Maria Mandigers; Franz Sorg; Peter Deufel; Peter Schaap

Archive | 2009

OPTICAL APPARATUS AND METHOD FOR MODIFYING THE IMAGING BEHAVIOR OF SUCH APPARATUS

Martin Schriever; Ulrich Wegmann; Stefan Hembacher; Bernhard Geuppert; Juergen Huber; Norbert Kerwien; Michael Totzeck; Markus Hauf

Archive | 2007

Projection exposure system e.g. step-and-scan system, for semiconductor lithography, has optical element e.g. lens, manipulated by actuator of manipulator e.g. Alvarez-element, where manipulator is designed in exchangeable manner

Bernhard Gellrich; Bernhard Geuppert; Aksel Göhnermeier; Dirk Hellweg; Stefan Hembacher; Jens Kugler; Guido Limbach; Ulrich Loering; Peter Meyer; Armin Schöppach; Franz Sorg; Ulrich Weber; Stefan Xalter

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Jens Kugler

Carl Zeiss AG

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Stefan Hembacher

Carl Zeiss AG

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Bernhard Gellrich

Carl Zeiss AG

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Guido Limbach

Carl Zeiss AG

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Stefan Xalter

Carl Zeiss AG

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Ulrich Wegmann

Carl Zeiss AG

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Franz Sorg

Carl Zeiss AG

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Martin Schriever

Carl Zeiss AG

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Peter Deufel

Carl Zeiss AG

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Burkhard Corves

Carl Zeiss AG

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