Network


Latest external collaboration on country level. Dive into details by clicking on the dots.

Hotspot


Dive into the research topics where András G. Major is active.

Publication


Featured researches published by András G. Major.


Proceedings of SPIE, the International Society for Optical Engineering | 2009

Performance of a programmable illuminator for generation of freeform sources on high NA immersion systems

Andre Engelen; Oscar Noordman; Robert Kazinczi; Gert Streutker; Bert van Drieenhuizen; Keith Gronlund; Markus Degünther; Dirk Jürgens; Johannes Eisenmenger; Michael Patra; András G. Major

This paper describes the principle and performance of a fully programmable illuminator for a high-NA immersion system. Sources can be generated on demand, by manipulating an array of mirrors instead of the traditional way of inserting optical elements and changing lens positions. All mirrors are always used to create the source such that no light is lost when switching from one source shape to another. Measured sources generated with this new type of illumination system will be shown and compared to the target sources generated by source mask optimization software or targets of traditional sources. Comparison between measured and target source will be done both in parameters of a pupil fit model and by simulated imaging impact. Also the first results in resist obtained on a XTIV 1950Hi 1.35 NA tool equipped with this illuminator are presented and compared to measurements on the same system when it was equipped with an Aerial XP illumination system.


Archive | 2010

Illumination system of a microlithographic projection exposure apparatus

Damian Fiolka; Ralf Mueller; András G. Major


Archive | 2014

Method and device for monitoring multiple mirror arrays in an illumination system of a microlithographic projection exposure apparatus

Stefan Xalter; Yim-Bun Patrick Kwan; András G. Major; Manfred Maul; Johannes Eisenmenger; Damian Fiolka; Jan Horn; Markus Deguenther; Florian Bach; Michael Patra; Johannes Wangler; Michael Layh


Archive | 2010

Monitoring von kippbaren Spiegeln

Jan Horn; András G. Major


Archive | 2010

Monitoring of tiltable mirrors

Jan Horn; András G. Major; Christian Kempter; Ulrich Bihr


Archive | 2012

Optische Anordnung für eine EUV-Projektionsbelichtungsanlage sowie Verfahren zum Kühlen eines optischen Bauelements

Willi Anderl; Holger Kierey; Markus Bauer; Severin Waldis; András G. Major


Archive | 2012

Illumination system for micro-lithographic projection exposure apparatus, has several light deflection elements which generate two respective light spots whose intensity differs from each other by the polarization state of light spots

Damian Fiolka; Olaf Dittmann; Ralf Müller; Gundula Weiss; András G. Major; Martin Vogt; Jörg Zimmermann


Archive | 2011

Optical system for a microlithographic projection apparatus

Ingo Sänger; Ralf Scharnweber; Olaf Dittmann; Toralf Gruner; Gundula Weiss; András G. Major; Martin Vogt; Markus Degünther; Johannes Wangler; Thomas Korb; Severin Waldis


Archive | 2014

Extreme UV (EUV) projection exposure system used for microlithography process, has control unit that controls heating/cooling device, so that absolute constant temperature profile is adjustable in partial region of mirrors

Norman Baer; Erwin Gaber; Jochen Hetzler; András G. Major


Archive | 2013

Method and arrangement for determining the heating condition of a mirror in an optical system

Peter Vogt; Martin Hermann; Oliver Dier; András G. Major

Collaboration


Dive into the András G. Major's collaboration.

Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Top Co-Authors

Avatar
Researchain Logo
Decentralizing Knowledge