Gundula Weiss

Illumination system for micro-lithographic projection exposure apparatus, has several light deflection elements which generate two respective light spots whose intensity differs from each other by the polarization state of light spots

Method of producing a diffractive optical element and diffractive optical element produced by such a method

Verfahren zur Herstellung eines diffraktiven optischen Elements, nach einem derartigen Verfahren hergestelltes diffraktives optisches Element, Beleuchtungsoptik mit einem derartigen diffratkiven optischen Element, Mikrolithografie-Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik, Verfahren zum Herstellen eines mikroelektronischen Bauelements unter Verwendung einer derartigen Projektionsbelichtungsanlage sowie mit einem solchen Verfahren hergestelltes Bauelement

OPTICAL BEAM DEFLECTING ELEMENT, ILLUMINATION SYSTEM INCLUDING SAME, AND RELATED METHOD

Optical system for a microlithographic projection apparatus

Optical system of an illumination device of a projection exposure apparatus

Microlithographic projection exposure system

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS HAVING A MULTI-MIRROR ARRAY WITH TEMPORAL STABILISATION

Optical beam deflecting element and method of adjustment

Illumination device for a microlithographic projection apparatus having an element made of uniaxial crystal and having a plurality of refractive or diffractive structures extending along an axis being parallel or perpendicular to the crystal axis