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Gundula Weiss

Carl Zeiss AG

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Publication

Featured researches published by Gundula Weiss.

Archive | 2012

Illumination system for micro-lithographic projection exposure apparatus, has several light deflection elements which generate two respective light spots whose intensity differs from each other by the polarization state of light spots

Damian Fiolka; Olaf Dittmann; Ralf Müller; Gundula Weiss; András G. Major; Martin Vogt; Jörg Zimmermann

Archive | 2008

Method of producing a diffractive optical element and diffractive optical element produced by such a method

Harald Volkenandt; Gundula Weiss

Archive | 2007

Verfahren zur Herstellung eines diffraktiven optischen Elements, nach einem derartigen Verfahren hergestelltes diffraktives optisches Element, Beleuchtungsoptik mit einem derartigen diffratkiven optischen Element, Mikrolithografie-Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik, Verfahren zum Herstellen eines mikroelektronischen Bauelements unter Verwendung einer derartigen Projektionsbelichtungsanlage sowie mit einem solchen Verfahren hergestelltes Bauelement

Harald Volkenandt; Gundula Weiss

Archive | 2012

OPTICAL BEAM DEFLECTING ELEMENT, ILLUMINATION SYSTEM INCLUDING SAME, AND RELATED METHOD

Daniel Runde; Florian Doll; Reinhard Voelkel; Kenneth Weible; Gundula Weiss; Michael Gerhard

Archive | 2011

Optical system for a microlithographic projection apparatus

Ingo Sänger; Ralf Scharnweber; Olaf Dittmann; Toralf Gruner; Gundula Weiss; András G. Major; Martin Vogt; Markus Degünther; Johannes Wangler; Thomas Korb; Severin Waldis

Archive | 2007

Optical system of an illumination device of a projection exposure apparatus

Karl-Heinz Schuster; Juergen Hartmaier; Manfred Maul; Dieter Schmerek; Detlev Mueller; Otto Hahnemann; Frank Marianek; Gundula Weiss; Damian Fiolka

Archive | 2005

Microlithographic projection exposure system

Markus Degünther; Damian Fiolka; Michael Layh; Manfred Maul; Michael Patra; Johannes Wangler; Gundula Weiss

Archive | 2010

MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS HAVING A MULTI-MIRROR ARRAY WITH TEMPORAL STABILISATION

Michael Layh; Markus Deguenther; Michael Patra; Johannes Wangler; Manfred Maul; Damian Fiolka; Gundula Weiss

Archive | 2009

Optical beam deflecting element and method of adjustment

Daniel Runde; Florian Doll; Reinhard Völkel; Kenneth J. Weible; Gundula Weiss; Michael Gerhard

Archive | 2007

Illumination device for a microlithographic projection apparatus having an element made of uniaxial crystal and having a plurality of refractive or diffractive structures extending along an axis being parallel or perpendicular to the crystal axis

Karl-Heinz Schuster; Jürgen Hartmaier; Manfred Maul; Dieter Schmerek; Detlev Müller; Otto Hahnemann; Frank Marianek; Gundula Weiss; Damian Fiolka

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Damian Fiolka

Carl Zeiss AG

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Manfred Maul

Carl Zeiss AG

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Dieter Schmerek

Carl Zeiss AG

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Frank Marianek

Carl Zeiss AG

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Karl-Heinz Schuster

Carl Zeiss AG

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Otto Hahnemann

Carl Zeiss AG

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Harald Volkenandt

Carl Zeiss AG

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Martin Vogt

Carl Zeiss AG

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Olaf Dittmann

Carl Zeiss AG

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András G. Major

Carl Zeiss AG

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