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Arthur H. Laflamme

Tokyo Electron

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Publication

Featured researches published by Arthur H. Laflamme.

Archive | 2004

Processing system and method for treating a substrate

Thomas Hamelin; Jay Wallace; Arthur H. Laflamme

Archive | 2003

Processing system and method for chemically treating a substrate

Thomas Hamelin; Jay Wallace; Arthur H. Laflamme

Archive | 2003

Reduced maintenance chemical oxide removal (COR) processing system

Arthur H. Laflamme; Thomas Hamelin; Jay Wallace

Archive | 2003

Processing system and method for thermally treating a substrate

Thomas Hamelin; Jay Wallace; Arthur H. Laflamme

Archive | 2005

Chemical processing system and method

Arthur H. Laflamme; Jay Wallace; Eric J. Strang

Archive | 2000

Etching system and etching chamber

Richard J. Freeman; Jay Wallace; Yoichi Kurono; Arthur H. Laflamme; Louise Smith Barriss; Tadashi Onishi

Archive | 2014

DESICCANT AIR CONDITIONING METHODS AND SYSTEMS

Peter F. Vandermeulen; Arthur H. Laflamme; Mark Allen; Robert Doody; David Pitcher

Archive | 2013

Methods and systems for turbulent, corrosion resistant heat exchangers

Peter F. Vandermeulen; Mark Allen; Arthur H. Laflamme

Archive | 2006

Reduced contaminant gas injection system and method of using

Takashi Enomoto; Masaaki Hagihara; Akiteru Ko; Shinji Hamamoto; Masafumi Urakawa; Arthur H. Laflamme; Edward Heller

Archive | 2001

Electronic device processing equipment having contact gasket between chamber parts

Stephen N. Golovato; Arthur H. Laflamme; Jay Wallace

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Collaboration

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Jay Wallace

Tokyo Electron

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Thomas Hamelin

Tokyo Electron

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Eric J. Strang

Tokyo Electron

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Akiteru Ko

Tokyo Electron

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Edward Heller

Tokyo Electron

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Gregory R. Whyman

Tokyo Electron

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Louise Smith Barriss

Tokyo Electron

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Masaaki Hagihara

Tokyo Electron

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Masafumi Urakawa

Tokyo Electron

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Richard J. Freeman

Tokyo Electron

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