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Jay Wallace

Tokyo Electron

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Publication

Featured researches published by Jay Wallace.

Archive | 2004

Processing system and method for treating a substrate

Thomas Hamelin; Jay Wallace; Arthur H. Laflamme

Archive | 2003

Processing system and method for chemically treating a substrate

Thomas Hamelin; Jay Wallace; Arthur H. Laflamme

Archive | 2003

Reduced maintenance chemical oxide removal (COR) processing system

Arthur H. Laflamme; Thomas Hamelin; Jay Wallace

Archive | 2003

Processing system and method for thermally treating a substrate

Thomas Hamelin; Jay Wallace; Arthur H. Laflamme

Archive | 2005

Chemical processing system and method

Arthur H. Laflamme; Jay Wallace; Eric J. Strang

Archive | 2004

Method and apparatus for thermally insulating adjacent temperature controlled processing chambers

Jay Wallace; Thomas Hamelin

Archive | 2000

Etching system and etching chamber

Richard J. Freeman; Jay Wallace; Yoichi Kurono; Arthur H. Laflamme; Louise Smith Barriss; Tadashi Onishi

Archive | 2008

HIGH THROUGHPUT PROCESSING SYSTEM FOR CHEMICAL TREATMENT AND THERMAL TREATMENT AND METHOD OF OPERATING

Jay Wallace; Thomas Hamelin

Archive | 2008

Substrate support for high throughput chemical treatment system

Jay Wallace; Hiroyuki Takahashi

Archive | 2001

Electronic device processing equipment having contact gasket between chamber parts

Stephen N. Golovato; Arthur H. Laflamme; Jay Wallace

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Arthur H. Laflamme

Tokyo Electron

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Thomas Hamelin

Tokyo Electron

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Eric J. Strang

Tokyo Electron

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Hiroyuki Takahashi

Tokyo Electron

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Charles R. Launsby

Tokyo Electron

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Louise Smith Barriss

Tokyo Electron

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Richard J. Freeman

Tokyo Electron

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Stephen N. Golovato

Tokyo Electron

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Steven T. Fink

Tokyo Electron

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Tadashi Onishi

Tokyo Electron

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