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Dive into the research topics where Atsushi Himeno is active.

Publication


Featured researches published by Atsushi Himeno.


international electron devices meeting | 2008

Highly reliable TaOx ReRAM and direct evidence of redox reaction mechanism

Zhiqiang Wei; Yoshihiko Kanzawa; K. Arita; Yoshikazu Katoh; Ken Kawai; Shunsaku Muraoka; S. Mitani; Satoru Fujii; Koji Katayama; M. Iijima; Takumi Mikawa; Takeki Ninomiya; R. Miyanaga; Y. Kawashima; K. Tsuji; Atsushi Himeno; T. Okada; Ryotaro Azuma; Kazuhiko Shimakawa; H. Sugaya; Takeshi Takagi; R. Yasuhara; K. Horiba; H. Kumigashira; Masaharu Oshima

Highly reliable TaOx ReRAM has been successfully demonstrated. The memory cell shows stable pulse switching with endurance over 109 cycles, sufficient retention exceeding 10 years at 85degC. TaOx exhibits stable high and low resistance states based on the redox reaction mechanism, confirmed by HX-PES directly for the first time. An 8 kbit 1T1R memory array with a good operating window has been fabricated using the standard 0.18 mum CMOS process.


international solid-state circuits conference | 2012

An 8 Mb Multi-Layered Cross-Point ReRAM Macro With 443 MB/s Write Throughput

Akifumi Kawahara; Ryotaro Azuma; Yuuichirou Ikeda; Ken Kawai; Yoshikazu Katoh; Kouhei Tanabe; Toshihiro Nakamura; Yoshihiko Sumimoto; Naoki Yamada; Nobuyuki Nakai; Shoji Sakamoto; Yukio Hayakawa; Kiyotaka Tsuji; Shinichi Yoneda; Atsushi Himeno; Kenichi Origasa; Kazuhiko Shimakawa; Takeshi Takagi; Takumi Mikawa; Kunitoshi Aono

Nonvolatile memories with fast write operation at low voltage are required as storage devices to exceed flash memory performance. We develop an 8Mb multi-layered cross-point ReRAM macro with 443MB/S write throughput (64b parallel write per 17.2ns cycle), which is almost twice as fast as existing methods, using the fast-switching performance of TaOχ ReRAM and the following three techniques to reduce the sneak current in bipolar type cross-point cell array structure in an 0.18μm process. First, memory cell and array technologies reduce the sneak current with a newly developed bidirectional diode as a memory cell select element for the first time. Second, we use a hierarchical bitline (BL) structure for multi-layered cross-point memory with fast and stable current control. Third, we implement a multi-bit write architecture that realizes fast write operation and suppresses sneak current. This work is applicable to both high-density stand-alone and embedded memory with more stacked memory arrays and/or scaling memory cells.


international solid-state circuits conference | 2013

Filament scaling forming technique and level-verify-write scheme with endurance over 107 cycles in ReRAM

Akifumi Kawahara; Ken Kawai; Yuuichirou Ikeda; Yoshikazu Katoh; Ryotaro Azuma; Yuhei Yoshimoto; Kouhei Tanabe; Zhiqiang Wei; Takeki Ninomiya; Koji Katayama; Ryutaro Yasuhara; Shunsaku Muraoka; Atsushi Himeno; Naoki Yoshikawa; Hideaki Murase; Kazuhiko Shimakawa; Takeshi Takagi; Takumi Mikawa; Kunitoshi Aono

Resistive RAM (ReRAM) has been recently developed for applications that require higher speed and lower voltage than Flash memory is able to provide. One of the applications is micro-controller units (MCUs) or SoCs with several megabits of embedded ReRAM. Another is solid-state drives (SSDs) where a combination of higher-density ReRAM and NAND flash memory would achieve high-performance and high-reliability storage [1], suitable for server applications for future cloud computing. ReRAM is attractive for several reasons. First, it operates at high speed and low voltage. Second, it enables high density due to the simple structure of the resistive element (RE) [2]. Third, it is immune to external environment such as magnetic fields or radiation, since the resistive switching is based on the redox reaction [3].


symposium on vlsi circuits | 2015

Highly reliable TaO x ReRAM with centralized filament for 28-nm embedded application

Yukio Hayakawa; Atsushi Himeno; Ryutaro Yasuhara; W. Boullart; Emma Vecchio; T. Vandeweyer; T. Witters; D. Crotti; M. Jurczak; Satoru Fujii; Shigeru Ito; Yoshio Kawashima; Yuuichirou Ikeda; Akifumi Kawahara; Ken Kawai; Zhiqiang Wei; Shunsaku Muraoka; Kazuhiko Shimakawa; Takumi Mikawa; Shinichi Yoneda


Archive | 2010

RESISTANCE VARIABLE ELEMENT AND RESISTANCE VARIABLE MEMORY DEVICE

Koji Arita; Takumi Mikawa; Atsushi Himeno; Yoshio Kawashima; Kenji Tominaga


Archive | 2011

Variable resistance nonvolatile memory element, method of manufacturing the same, and variable resistance nonvolatile memory device

Atsushi Himeno; Kiyotaka Tsuji


Archive | 2009

Nonvolatile storage device and method for manufacturing the device

Takumi Mikawa; 三河巧; Yoshio Kawashima; 川島良男; Atsushi Himeno; 姫野敦史


Archive | 2011

Nonvolatile memory element, nonvolatile memory device, and manufacturing method for the same

Atsushi Himeno; Haruyuki Sorada; Yukio Hayakawa; Takumi Mikawa


Archive | 2010

Variably resistant element and variably resistant memory device

Koji Arita; 有田浩二; Takumi Mikawa; 三河巧; Atsushi Himeno; 姫野敦史; Yoshio Kawashima; 川島良男; Kenji Tominaga; 富永健司


Archive | 2011

Variable resistance nonvolatile memory device and method of manufacturing the same

Atsushi Himeno; Haruyuki Sorada; Takumi Mikawa

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