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Ayumi Minamide

Mitsubishi

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Publication

Featured researches published by Ayumi Minamide.

Archive | 1997

Fine pattern forming material, manufacture of semiconductor device using same, and semiconductor device

Takeo Ishibashi; Keiichi Katayama; Ayumi Minamide; Toshiyuki Toyoshima; あゆみ 南出; 圭一 片山; 健夫 石橋; 利之 豊島

Archive | 1998

Material for forming a fine pattern and method for manufacturing a semiconductor device using the same

Takeo Ishibashi; Toshiyuki Toyoshima; Keiichi Katayama; Ayumi Minamide

Archive | 1998

Material for forming fine pattern in semiconductor manufacture

Takeo Ishibashi; Toshiyuki Toyoshima; Ayumi Minamide; Keiichi Katayama

Archive | 1996

Registration accuracy measurement mark

Koichiro Narimatsu; Shigenori Yamashita; Nobuyuki Yoshioka; Shinya Soeda; Atsushi Hachisuka; Koji Taniguchi; Yuki Miyamoto; Takayuki Saito; Ayumi Minamide

Archive | 1999

Resist pattern forming method utilizing multiple baking and partial development steps

Ayumi Minamide; Takeo Ishibashi

Archive | 1996

Compatibility precision measurement mark for semiconductor photomask manufacture

Koichiro Narimatsu; Shigenori Yamashita; Nobuyuki Yoshioka; Shinya Soeda; Atsushi Hachisuka; Kouji Taniguchi; Yuki Miyamoto; Takayuki Saito; Ayumi Minamide

Archive | 1998

Verfahren zur Herstellung eines feinen Musters und einer Halbleitervorrichtung

Takeo Ishibashi; Ayumi Minamide; Toshiyuki Toyoshima; Keiichi Katayama

Archive | 1997

Verfahren zur Herstellung eines feinen Musters und einer Halbleitervorrichtung A process for producing a fine pattern and a semiconductor device

Takeo Ishibashi; Keiichi Katayama; Ayumi Minamide; Toshiyuki Toyoshima

Archive | 1996

Meßmarkenaufbau, photomask method of forming a Meßmarkenaufbaues and method for repairing a defect

Koichiro Narimatsu; Shigenori Yamashita; Nobuyuki Yoshioka; Shinya Soeda; Atsushi Hachisuka; Kouji Taniguchi; Yuki Miyamoto; Takayuki Saito; Ayumi Minamide

Archive | 1996

Meßmarkenaufbau, Photomaske, Verfahren zum Bilden eines Meßmarkenaufbaues und Verfahren zum Reparieren eines Defektes Meßmarkenaufbau, photomask process for forming a Meßmarkenaufbaues and method for repairing a defect

Koichiro Narimatsu; Shigenori Yamashita; Nobuyuki Yoshioka; Shinya Soeda; Atsushi Hachisuka; Kouji Taniguchi; Yuki Miyamoto; Takayuki Saito; Ayumi Minamide

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Collaboration

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Takeo Ishibashi

Mitsubishi Electric

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Atsushi Hachisuka

Renesas Electronics

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Keiichi Katayama

Mitsubishi Electric

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Koichiro Narimatsu

Renesas Electronics

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Nobuyuki Yoshioka

Mitsubishi Electric

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Shigenori Yamashita

Renesas Electronics

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Shinya Soeda

Renesas Electronics

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Takayuki Saito

Mitsubishi

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Toshiyuki Toyoshima

Mitsubishi Electric

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Yuki Miyamoto

Shizuoka University

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