Barney M. Cohen

Reactive plasma etch cleaning of high aspect ratio openings

Precleaning process for metal plug that minimizes damage to low-κ dielectric

Thermal post-deposition treatment of halogen-doped films to improve film stability and reduce halogen migration to interconnect layers

Inductively coupled plasma reactor with top electrode for enhancing plasma ignition

Cleaning contact with successive fluorine and hydrogen plasmas

Plasma preclean with argon, helium, and hydrogen gases

Methods of pre-cleaning dielectric layers of substrates

R.F. plasma reactor with larger-than-wafer pedestal conductor

Pedestal insulator for a pre-clean chamber

Plasma reactor and pedestal for supporting semiconductor substrate in a plasma reactor