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Been-Jon Woo

Intel

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Publication

Featured researches published by Been-Jon Woo.

Archive | 1991

Process for fabricating a flash EPROM having reduced cell size

Been-Jon Woo; Gregory Atwood; Stefan K. C. Lai; T. C. Ong

Archive | 1986

Method of fabricating a MOSFET with graded source and drain regions

Been-Jon Woo; Mark A. Holler; Ender Hokelek; Sandra S Lee

Archive | 1991

Method for improving erase characteristics of buried bit line flash EPROM devices without using sacrificial oxide growth and removal steps

Been-Jon Woo; Mark A. Holler

Archive | 1992

Erase performance improvement via dual floating gate processing

Been-Jon Woo

Archive | 1987

Source drain doping technique

Been-Jon Woo; Mark A. Holler; Ender Hokelek; Sandra S Lee

Archive | 1990

Method for improving device scalability of buried bit line flash EPROM devices having short reoxidation beaks and shallower junctions

Been-Jon Woo

Archive | 1993

Silicidation method for contactless EPROM related devices

Been-Jon Woo

Archive | 1988

Tungsten-silicide reoxidation process including annealing in pure nitrogen and subsequent oxidation in oxygen

Been-Jon Woo

Archive | 1990

Method for improving erase characteristics of buried bit line flash EPROM devices by use of a thin nitride layer formed during field oxide growth

Been-Jon Woo; Mark A. Holler

Archive | 1988

Tungsten-silicide reoxidation technique using a CVD oxide cap

Been-Jon Woo; Wei-Jen Lo

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Mark A. Holler

Intel

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Ender Hokelek

Intel

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Sandra S Lee

Intel

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Max Wei

Intel

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Albert Fazio

Intel

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Tong-Chern Ong

Intel

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Wei-Jen Lo

Intel

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Yudong Kim

Intel

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