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Boris Bayha

GlobalFoundries

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Publication

Featured researches published by Boris Bayha.

Archive | 2010

Uniform high-k metal gate stacks by adjusting threshold voltage for sophisticated transistors by diffusing a metal species prior to gate patterning

Richard Carter; Falk Graetsch; Martin Trentzsch; Sven Beyer; Berthold Reimer; Robert Binder; Boris Bayha

Archive | 2012

Method of forming a material layer in a semiconductor structure

Carsten Grass; Martin Trentzsch; Boris Bayha; Peter Krottenthaler

Archive | 2011

Gleichmäßige Metallgatestapel mit großem ε durch Einstellen einer Schwellwertspannung für komplexe Transistoren durch Diffundieren einer Metallsorte vor der Gatestrukturierung

Richard Carter; Falk Graetsch; Martin Trentzsch; Sven Beyer; Berthold Reimer; Robert Binder; Boris Bayha

Archive | 2010

ENHANCING SELECTIVITY DURING FORMATION OF A CHANNEL SEMICONDUCTOR ALLOY BY A WET OXIDATION PROCESS

Stephan Kronholz; Carsten Reichel; Falk Graetshe; Boris Bayha

Archive | 2012

METHODS FOR FABRICATING SEMICONDUCTOR DEVICES WITH REDUCED DAMAGE TO SHALLOW TRENCH ISOLATION (STI) REGIONS

Hans-Jürgen Thees; Boris Bayha

Archive | 2012

CET AND GATE CURRENT LEAKAGE REDUCTION IN HIGH-K METAL GATE ELECTRODE STRUCTURES BY HEAT TREATMENT AFTER DIFFUSION LAYER REMOVAL

Torben Kelwing; Martin Trentzsch; Boris Bayha; Carsten Grass; Richard Carter

Microelectronics Reliability | 2014

A quantitative study of Phosphorous implantation damage on the thick gate oxide of the 28 nm node

Xinggong Wan; Sandhya Chandrashekhar; Boris Bayha; Martin Trentzsch; Torben Balzer; Mahesh Siddabathula; Oliver Aubel

Archive | 2013

Verfahren zum Bilden einer Materialschicht in einer Halbleiterstruktur

Carsten Grass; Martin Trentzsch; Boris Bayha; Peter Krottenthaler

Archive | 2013

CET und GATE-Leckstromverringerung in Metall-GATE-Elektrodenstrukturen mit grossem ε durch Wärmebehandlung und nach Entfernung der Diffusionsschicht

Torben Kelwing; Martin Trentzsch; Boris Bayha; Carsten Grass; Richard Carter

Archive | 2011

Erhöhung der Selektivität während der Herstellung einer Kanalhalbleiterlegierung durch einen nassen Oxidationsprozess

Stephan Kronholz; Carsten Reichel; Falk Graetsche; Boris Bayha

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Collaboration

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Martin Trentzsch

GlobalFoundries

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Carsten Grass

GlobalFoundries

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Carsten Reichel

GlobalFoundries

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Richard Carter

GlobalFoundries

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Falk Graetsche

GlobalFoundries

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Berthold Reimer

GlobalFoundries

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Falk Graetsch

GlobalFoundries

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Peter Krottenthaler

GlobalFoundries

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Robert Binder

GlobalFoundries

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Stephan Kronholz

Advanced Micro Devices

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