Bryan G. Moosman

Long-term reliable operation of a MOPA-based ArF light source for microlithography

Since the introduction of the XLA-100 in January 2003, we have built, tested, and shipped a large number of XLA-100 MOPA lasers to microlithography scanner manufacturers. Some systems have already been installed at chip fabrication lines. To ensure product design robustness, we have been performing a long-term system performance test of an XLA-100 laser at Cymer. In this paper, we will report optical performance of the XLA-100 we see during manufacturing final tests, and a summary of the long term testing.