Is this you? Create Your Porfile
Avatar

Carl White

Tokyo Electron

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Carl White is active.

Explore More

Publication

Featured researches published by Carl White.

Archive | 1992

Semiconductor wafer processing method and apparatus with heat and gas flow control

Robert F. Foster; Helen Rebenne; Rene E. Leblanc; Carl White; Rikhit Arora

Archive | 1992

Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten CVD

Robert F. Foster; Helen Rebenne; Rene E. Leblanc; Carl White; Rikhit Arora

Archive | 1996

Method for isolating a susceptor heating element from a chemical vapor deposition environment

Carl White; Jon R. MacErnie; Joseph T. Hillman

Archive | 1993

Semiconductor wafer processing cvd reactor cleaning method and apparatus

Robert F. Foster; Helen Rebenne; Rene E. Leblanc; Carl White; Rikhit Arora

Archive | 1993

Rotierende halterung als maschinenteil für die bearbeitung von halbleiterplättchen, einsetzbar bei der chemischen gasphasenabscheidung von wolfram

Rikhit Arora; Robert F. Foster; Rene E. Leblanc; Helen Rebenne; Carl White

Archive | 1995

Verfahren und vorrichtung zum isolieren eines halterungs-heizungelements von einem raum zur chemischen gasphasenabscheidung der cvd-umgebung

Joseph T. Hillman; Jon R. Macernie; Carl White

Archive | 1993

Procede et appareil d'epuration d'un reacteur par procede cvd dans le traitement de tranches a semi-conducteurs.

Robert F. Foster; Helen Rebenne; Rene E. Leblanc; Carl White; Rikhit Arora

Archive | 1993

Procede et appareil de traitement de tranches de semi-conducteurs a regulation du flux thermique et gazeux

Rikhit Arora; Robert F. Foster; Rene E. Leblanc; Helen Rebenne; Carl White

Archive | 1993

Rotierende halterung als maschinenteil für die bearbeitung von halbleiterplättchen, einsetzbar bei der chemischen gasphasenabscheidung von wolfram Rotating holder tungsten as a machine part for machining semiconductor plate, used in the chemical gas phase deposition of

Robert F. Foster; Helen Rebenne; Rene E. Leblanc; Carl White; Rikhit Arora

Archive | 1993

Methode zur behandlung von halbleiter-wafern und apparat mit kontolle des waerme- und des gasflusses Method for the treatment of semiconductor wafers and apparatus with control of the conditions-heat, and the gas flow

Robert F. Foster; Helen Rebenne; Rene E. Leblanc; Carl White; Rikhit Arora

Explore More

Collaboration

Dive into the Carl White's collaboration.

Top Co-Authors
Avatar

Helen Rebenne

Tokyo Electron

View shared research outputs
Top Co-Authors
Avatar

Rene E. Leblanc

Tokyo Electron

View shared research outputs
Top Co-Authors
Avatar

Rikhit Arora

Tokyo Electron

View shared research outputs
Top Co-Authors
Avatar

Robert F. Foster

Tokyo Electron

View shared research outputs
Top Co-Authors
Avatar

Joseph T. Hillman

Tokyo Electron

View shared research outputs
Top Co-Authors
Avatar

Jon R. MacErnie

Tokyo Electron

View shared research outputs
Explore More
Researchain Logo
Decentralizing Knowledge