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Christoph Dr. Hohle

Infineon Technologies

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Publication

Featured researches published by Christoph Dr. Hohle.

Archive | 2006

Integrated circuit`s structural component manufacturing method, involves performing thermal baking-out process in coating for diffusion of acids into polymer in lacquer such that acids are split up into process-soluble groups

Klaus Elian; Nicole Heckmann; Christoph Dr. Hohle

Archive | 2004

Hotplate-Apparatur zur Prozessierung von Halbleiterwafern

Waltraud Herbst; Christoph Dr. Hohle

Archive | 2004

Testing appliance for molecular components of e.g. semiconductor memories with testing structure using chemical amplification of resist lines process and testing structure for molecular components

Klaus Elian; Marcus Halik; Christoph Dr. Hohle; Hagen Klauk; Günter Schmid; Michael Sebald; Ute Zschieschang

Archive | 2004

Testanordnung für molekulare Bauelemente Test arrangement for molecular devices

Klaus Elian; Marcus Halik; Christoph Dr. Hohle; Hagen Klauk; Günter Schmid; Michael Sebald; Ute Zschieschang

Archive | 2004

Hotplate for processing semiconductor wafers has means to heat the chamber surface above the wafer to prevent condensation of evaporated material

Waltraud Herbst; Christoph Dr. Hohle

Archive | 2004

Verfahren zum Ausbilden einer Lithografiemaske A method of forming a lithographic mask

Waltraud Herbst; Christoph Dr. Hohle; Karl Kragler; Michael Sebald

Archive | 2001

Transparenzverbesserung von Resist-Copolymeren für die 157 nm-Fotolithografie durch Einsatz von fluorierten Zimtsäurederivaten Improving transparency resist copolymers for 157 nm photolithography through the use of fluorinated cinnamic acid derivatives

Christian Eschbaumer; Christoph Dr. Hohle; Jörg Rottstegge; Michael Sebald

Archive | 2001

Negativ Resistprozess mit simultaner Entwicklung und Silylierung Negative resist process with simultaneous development and silylation

Christian Eschbaumer; Gertrud Falk; Waltraud Herbst; Christoph Dr. Hohle; Eberhard Kühn; Jörg Rottstegge; Michael Sebald

Archive | 2001

Verfahren zur Silylierung von Fotoresists im UV-Bereich Process for the silylation of the photoresist in the UV range

Christian Eschbaumer; Jens Ferbitz; Christoph Dr. Hohle; Werner Mormann; Jörg Rottstegge; Michael Sebald

Archive | 2001

Transparency improvement of resist copolymer for 157 nm photolithography through the use of fluorinated cinnamic acid derivatives

Christian Eschbaumer; Christoph Dr. Hohle; Jörg Rottstegge; Michael Sebald

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Michael Sebald

Siemens

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Christian Eschbaumer

Infineon Technologies

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Jörg Rottstegge

Infineon Technologies

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Waltraud Herbst

Infineon Technologies

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Klaus Elian

Infineon Technologies

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Eberhard Kühn

Siemens

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Gertrud Falk

Infineon Technologies

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Günter Schmid

Infineon Technologies

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Hagen Klauk

Infineon Technologies

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Jens Ferbitz

Folkwang University of the Arts

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