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Gertrud Falk

Infineon Technologies

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Publication

Featured researches published by Gertrud Falk.

Archive | 2002

Process for sidewall amplification of resist structures and for the production of structures having reduced structure size

Jörg Rottstegge; Eberhard Kühn; Waltraud Herbst; Christian Eschbaumer; Christoph Hohle; Gertrud Falk; Michael Sebald

Archive | 2002

Photoresist compound and method for structuring a photoresist layer

Gertrud Falk; Eberhard Kuehn; Ernst Richter; Michael Sebald

Archive | 2002

Negative resist process with simultaneous development and silylation

Jörg Rottstegge; Eberhard Kühn; Waltraud Herbst; Christian Eschbaumer; Christoph Hohle; Gertrud Falk; Michael Sebald

Archive | 2002

Silylating process for photoresists in the UV region

Jörg Rottstegge; Gertrud Falk; Christian Eschbaumer; Christoph Hohle; Michael Sebald

Archive | 2002

Negative resist process with simultaneous development and aromatization of resist structures

Jörg Rottstegge; Eberhard Kühn; Christian Eschbaumer; Gertrud Falk; Michael Sebald

Archive | 2003

Process for increasing the etch resistance and for reducing the hole and trench width of a photoresist structure using solvent systems of low polarity

Jörg Rottstegge; Waltraud Herbst; Gertrud Falk; Eberhard Kühn

Archive | 2003

Process for modifying resist structures and resist films from the aqueous phase

Siew Siew Yip; Jörg Rottstegge; Ernst-christian Richter; Gertrud Falk; Michael Sebald; Kerstin Seibold; Marion Kern

Archive | 2002

Chemical amplification of photoresist, used as mask in microchip manufacture, uses resist based on polymer with acid-labile groups and anchor groups, liquid medium in coupling with amplification agent and water for final wash

Siew Siew Yip; Joerg Rottstegge; Ernst Richter; Gertrud Falk; Michael Sebald; Kerstin Seibold; Marion Kern

Archive | 2002

Chemical amplification of structurized resist, used in microchip production, uses resist based on polymer with acid-labile and anchor groups and photo-acid generator and treatment with amplification agent solution

Joerg Rottstegge; Waltraud Herbst; Gertrud Falk; Eberhard Kuehn

Archive | 2002

Verfahren zur Erhöhung der Ätzresistenz und zur Verkleinerung der Loch- oder Grabenbreite einer Fotoresiststruktur unter Verwendung von Lösungsmittelsystemen geringer Polarität

Joerg Rottstegge; Waltraud Herbst; Gertrud Falk; Eberhard Kuehn

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Michael Sebald

Siemens

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Jörg Rottstegge

Infineon Technologies

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Christian Eschbaumer

Infineon Technologies

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Waltraud Herbst

Infineon Technologies

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Eberhard Kühn

Siemens

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Christoph Hohle

Infineon Technologies

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Joerg Rottstegge

Infineon Technologies

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Eberhard Kuehn

Infineon Technologies

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Kerstin Seibold

Infineon Technologies

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Marion Kern

Infineon Technologies

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