Christopher Dennis Bencher

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Featured researches published by Christopher Dennis Bencher.

Archive | 2004

Techniques for the use of amorphous carbon (APF) for various etch and litho integration scheme

Wei Liu; Jim Zhongyi He; Sang H. Ahn; Meihua Shen; Hichem M'Saad; Wendy H. Yeh; Christopher Dennis Bencher

Archive | 2003

Silicon carbide deposition for use as a low-dielectric constant anti-reflective coating

Christopher Dennis Bencher; Joe Feng; Mei-Yee Shek; Chris Ngai; Judy H. Huang

Archive | 1998

SILICON CARBIDE DEPOSITION FOR USE AS A BARRIER LAYER AND AN ETCH STOP

Sudha Rathi; Ping Xu; Christopher Dennis Bencher; Judy H. Huang; Kegang Huang; Chris Ngai

Archive | 2005

Reticle fabrication using a removable hard mask

Christopher Dennis Bencher; Melvin Warren Montgomery; Alexander Buxbaum; Yung-Hee Yvette Lee; Jian Ding; Gilad Almogy; Wendy H. Yeh

Archive | 2004

Absorber layer for dynamic surface annealing processing

Luc Van Autryve; Christopher Dennis Bencher; Dean Jennings; Haifan Liang; Abhilash J. Mayur; Mark Yam; Wendy H. Yeh; Richard A. Brough

Archive | 2004

Method of depositing an amrphous carbon layer

Kevin Fairbairn; Michael J. Rice; Timothy Weidman; Christopher S. Ngai; Ian Scot Latchford; Christopher Dennis Bencher; Yuxiang May Wang

Archive | 2011

Innovative self-aligned triple patterning for 1x half pitch using single

Bencherki Mebarki; Hao D. Chen; Yongmei Chen; Aunchan Wang; Jingmei Liang; Kedar Sapre; Tushar Mandrekar; Xiaolin Chen; Ping Xu; Pokhui Blanko; Christopher S. Ngai; Christopher Dennis Bencher; Mehul S. Naik

Archive | 2001

Apparatus for reducing copper oxidation and contamination in a semiconductor device

Judy H. Huang; Christopher Dennis Bencher; Sudha Rathi; Christopher S. Ngai; Bok Hoen Kim

Archive | 2004

Absorberschicht für die dynamische oberflächenausheizverarbeitung

Luc Van Autryve; Christopher Dennis Bencher; Dean Jennings; Haifan Liang; Abhilash J. Mayur; Mark Yam; Wendy H. Yeh; Richard A. Brough

Archive | 2003

Masque dur et revetement antireflets et dielectriques exempts d'azote

Bok Heon Kim; Sudah Rathi; Sang H. Ahn; Christopher Dennis Bencher; Yuxiang M. Wang; Hichem M'Saad; Mario Dave Silvetti; Miguel S. Fung; Kee Bum Jung; Lei Zhu

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