David A. Cathey

Method for reducing, by a factor or 2-N, the minimum masking pitch of a photolithographic process

Field emission display

Method to form self-aligned gate structures around cold cathode emitter tips using chemical mechanical polishing technology

Method to form self-aligned gate structures and focus rings

Process for metallizing integrated circuits with electrolytically-deposited copper

Process for isotropically etching semiconductor devices

Method of selectively etching silicon dioxide dielectric layers on semiconductor wafers

Spacers for field emission display fabricated via self-aligned high energy ablation

Process for etching semiconductor devices

Method for etching high aspect ratio features