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David J. Keller

Micron Technology

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Publication

Featured researches published by David J. Keller.

Archive | 1992

Method for selectively etching polysilicon to gate oxide using an insitu ozone photoresist strip

David J. Keller

Archive | 1992

Use of a clean up step to form more vertical profiles of polycrystalline silicon sidewalls during the manufacture of a semiconductor device

David J. Keller; Guy T. Blalock

Archive | 1997

Method for etching nitride features in integrated circuit construction

David J. Keller

Archive | 1997

Method of etching or removing W and WSix films

David J. Keller

Archive | 1995

Method of forming contact plugs

Werner Juengling; Kirk Prall; Gordon A. Haller; David J. Keller; Tyler A. Lowrey

Archive | 2006

Semiconductor device fabrication and dry develop process suitable for critical dimension tunability and profile control

David J. Keller; Alex J. Schrinsky

Archive | 1997

Selective etch process

David J. Keller; Kevin G. Donohoe

Archive | 2007

Methods of forming NAND cell units

David J. Keller; Hongbin Zhu; Alex J. Schrinsky

Archive | 1998

Semiconductor transistor devices and methods for forming semiconductor transistor devices

Aftab Ahmad; David J. Keller

Archive | 1998

Method of forming CMOS circuitry including patterning a layer of conductive material overlying field isolation oxide

Aftab Ahmad; David J. Keller; Tyler A. Lowrey

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Alex J. Schrinsky

Micron Technology

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Kris K. Brown

Micron Technology

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Louie Liu

Micron Technology

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Aftab Ahmad

Micron Technology

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Hongbin Zhu

Micron Technology

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Tyler A. Lowrey

Micron Technology

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Debra K. Gould

Micron Technology

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Gordon A. Haller

Micron Technology

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Kirk Prall

Micron Technology

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Werner Juengling

Micron Technology

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