Doyle E. Bennett | Researchain

Archive Network Publication Hotspot Collaboration

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Doyle E. Bennett is active.

Explore More

Publication

Featured researches published by Doyle E. Bennett.

MRS Proceedings | 1999

A Novel Retaining Ring in Advanced Polishing Head Design for Significantly Improved CMP Performance

Thomas H. Osterheld; Steve Zuniga; Sidney P. Huey; Peter McKeever; Chad Garretson; Ben Bonner; Doyle E. Bennett; Raymond R. Jin

This paper reports a technological advancement in developing and implementing a novel retaining ring of advanced edge performance (AEP ring) for an advanced polishing head design. The AEP ring has been successfully used for significantly improved CMP performance in different CMP applications: oxide (PMD and ILD), shallow trench isolation (STI), polysilicon, metal (W and Cu), silicon-on-insulator (SOI), and silicon CMP. Robust processes have been developed using AEP ring along with many hardware upgrades for each application with extended runs to meet requirements of advanced IC device fabrication.

Archive | 1998

Method of post CMP defect stability improvement

Boris Fishkin; Charles C. Garretson; Peter McKeever; Thomas H. Osterheld; Gopalakrishna B. Prabhu; Doyle E. Bennett; Benjamin A. Bonner; Sidney P. Huey

Archive | 1998

Groove cleaning device for chemical-mechanical polishing

Brian J. Brown; Robert D. Tolles; James C. Nystrom; Doyle E. Bennett; Madhavi Chandrachood

Archive | 2003

Feedback controlled polishing processes

Doyle E. Bennett; Boguslaw A. Swedek; Arulkumar Shanmugasundram

Archive | 1998

Polishing pad with grooved pattern for use in chemical and mechanical polishing device

Ginetto Addiego; Doyle E. Bennett; Sen-Hou Ko; Tom Osterheld; Fred C. Redeker; アーディエゴジネット; コセン−ホウ; エドワードベネットドイル; オスターヘルドトム; シー．レデカーフレッド

Archive | 2004

Chemical mechanical polishing control system and method

Doyle E. Bennett; Jeffrey Drue David; Manoocher Birang; Jimin Zhang; Boguslaw A. Swedek

Archive | 2003

Chemical mechanical polishing apparatus with non-conductive elements

Doyle E. Bennett; Sandeep R Koppikar; Jeffrey Drue David; Boguslaw A. Swedek; Nils Johansson

china semiconductor technology international conference | 2012

CMP Process Control for Advanced CMOS Device Integration

Sidney P. Huey; Balaji Chandrasekaran; Doyle E. Bennett; Stan D. Tsai; Kun Xu; Jun Qian; Siva Dhandapani; Jeff David; Bogdan Swedek; Lakshmanan Karuppiah

Archive | 2000