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Benjamin Cherian

Applied Materials

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Publication

Featured researches published by Benjamin Cherian.

Archive | 2014

WEIGHTED REGRESSION OF THICKNESS MAPS FROM SPECTRAL DATA

Benjamin Cherian; Jeffrey Drue David; Boguslaw A. Swedek; Dominic J. Benvegnu; Jun Qian; Thomas H. Osterheld

Archive | 2016

Limiting Adjustment of Polishing Rates During Substrate Polishing

Dominic J. Benvegnu; Benjamin Cherian; Sivakumar Dhandapani; Harry Q. Lee

Archive | 2013

Reducing noise in spectral data from polishing substrates

Jeffrey Drue David; Boguslaw A. Swedek; Benjamin Cherian

Archive | 2013

FEED FORWARD PARAMETER VALUES FOR USE IN THEORETICALLY GENERATING SPECTRA

Jeffrey Drue David; Gregory E. Menk; Doyle E. Bennett; Jun Qian; Sivakumar Dhandapani; Benjamin Cherian; Thomas H. Osterheld; Boguslaw A. Swedek

Archive | 2013

Path for probe of spectrographic metrology system

Jeffrey Drue David; Benjamin Cherian; Dominic J. Benvegnu; Boguslaw A. Swedek; Thomas H. Osterheld; Jun Qian; Thomas Li; Doyle E. Bennett; David J. Lischka; Steven M. Zuniga

Archive | 2013

Polishing System with In-Sequence Sensor

Jeffrey Drue David; Boguslaw A. Swedek; Doyle E. Bennett; Thomas H. Osterheld; Benjamin Cherian; Dominic J. Benvegnu; Harry Q. Lee; Allen L. D Ambra; Jagan Rangarajan

Planarization/CMP Technology (ICPT 2012), International Conference on | 2012

In Situ Profile Control with Titan Edge TM Heads for Dielectric Planarization of Advanced CMOS Devices

Sivakumar Dhandapani; Jun Qian; Benjamin Cherian; Gregory E. Menk; Charles C. Garretson; Harry Q. Lee; Doyle E. Bennett; Thomas H. Osterheld

Planarization/CMP Technology (ICPT 2012), International Conference on | 2012

FullVision TM Endpoint for CMP of SiGe Fin Structures

Gregory E. Menk; Sivakumar Dhandapani; Y.-C. Huang; B. Wood; Jun Qian; Benjamin Cherian; Charles C. Garretson; Thomas H. Osterheld

Archive | 2012

Endpointing with selective spectral monitoring

Jun Qian; Sivakumar Dhandapani; Benjamin Cherian; Thomas H. Osterheld; Jeffrey Drue David; Gregory E. Menk; Boguslaw A. Swedek; Doyle E. Bennett

Archive | 2017

APPLYING DIMENSIONAL REDUCTION TO SPECTRAL DATA FROM POLISHING SUBSTRATES

Jeffrey Drue David; Boguslaw A. Swedek; Benjamin Cherian

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Thomas H. Osterheld

Applied Materials

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Boguslaw A. Swedek

Applied Materials

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Jeffrey Drue David

Applied Materials

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Jun Qian

Applied Materials

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Sivakumar Dhandapani

Applied Materials

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Doyle E. Bennett

Applied Materials

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Dominic J. Benvegnu

Applied Materials

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Harry Q. Lee

Applied Materials

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Gregory E. Menk

Applied Materials

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Charles C. Garretson

Applied Materials

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