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Eashwer Kollata

Applied Materials

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Publication

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Archive | 2008

METHODS AND APPARATUS FOR REMOVAL OF FILMS AND FLAKES FROM THE EDGE OF BOTH SIDES OF A SUBSTRATE USING BACKING PADS

Eashwer Kollata; Shou-sung Chang; Zhenhua Zhang; Paul D. Butterfield; Sen-Hou Ko; Antoine P. Manens; Gary C. Ettinger; Ricardo Martinez

Archive | 2008

METHODS AND APPARATUS FOR POLISHING A NOTCH OF A SUBSTRATE USING A POLISHING PAD

Gary C. Ettinger; Paul D. Butterfield; Antoine P. Manens; Zhenhua Zhang; Eashwer Kollata; Shou-sung Chang

Archive | 2008

METHODS AND APPARATUS FOR CONTROLLING THE SIZE OF AN EDGE EXCLUSION ZONE OF A SUBSTRATE

Zhenhua Zhang; Eashwer Kollata; Sen-Hou Ko

Archive | 2008

METHODS AND APPARATUS TO CONTROL SUBSTRATE BEVEL AND EDGE POLISHING PROFILES OF FILMS

Zhenhua Zhang; Paul D. Butterfield; Shou-sung Chang; Eashwer Kollata; Sen-Hou Ko

Archive | 2008

METHODS AND APPARATUS FOR USING A ROLLING BACKING PAD FOR SUBSTRATE POLISHING

Eashwer Kollata; Shou-sung Chang; Zhenhua Zhang; Paul D. Butterfield; Sen-Hou Ko; Antoine P. Manens; Gary C. Ettinger; Ricardo Martinez

Archive | 2008

METHODS AND APPARATUS FOR USING A BEVEL POLISHING HEAD WITH AN EFFICIENT TAPE ROUTING ARRANGEMENT

Eashwer Kollata; Shou-sung Chang; Zhenhua Zhang; Paul D. Butterfield; Sen-Hou Ko; Antoine P. Manens; Gary C. Ettinger; Ricardo Martinez

Archive | 2006

Electrochemical processing with dynamic process control

Eashwer Kollata; Antoine P. Manens; Pierre Fontarensky; Gregory C. Lee; Alain Duboust

Archive | 2008

METHODS AND APPARATUS FOR INDICATING A POLISHING TAPE END

Clinton Sakata; Jim K. Atkinson; Eashwer Kollata; Gary C. Ettinger

Archive | 2008

METHOD AND APPARATUS FOR CONTROLLING POLISHING PROFILE OF FILM ON SLOPE AND EDGE OF SUBSTRATE

Paul D. Butterfield; Shou-sung Chang; Sen-Hou Ko; Eashwer Kollata; Zhenhua Zhang; コラタ イーシュワー; チャン ショウ−スン; コ セン−ホウ; ザング ゼンフア; ディー． バターフィールド ポール

Archive | 2008

Method and device of using bevel polishing head having efficient tape routing layout

Paul D. Butterfield; Shou-sung Chang; C Ettinger Garry; Sen-Hou Ko; Eashwer Kollata; Antoine P. Manens; Ricardo Martines; Zhenhua Zhang; ピー． マネンス アントワーヌ; コラタ イーシュワー; シー． エッティンガー ギャリー; チャン ショウ−スン; コ セン−ホウ; ザング ゼンフア; ディー． バターフィールド ポール; マルチネス リカード

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Zhenhua Zhang

Applied Materials

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Antoine P. Manens

Applied Materials

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Paul D. Butterfield

Applied Materials

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Shou-sung Chang

Applied Materials

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Sen-Hou Ko

Applied Materials

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Gary C. Ettinger

Applied Materials

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Ricardo Martinez

Applied Materials

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Alain Duboust

Applied Materials

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Gregory C. Lee

Applied Materials

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Pierre Fontarensky

Applied Materials

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