Shou-sung Chang
Applied Materials
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Publication
Featured researches published by Shou-sung Chang.
advanced semiconductor manufacturing conference | 2010
Gregory E. Menk; Sivakumar Dhandapani; Charles C. Garretson; Shou-sung Chang; Jason Garcheung Fung; Stan D. Tsai
A new pad conditioning arm design enables the use of closed-loop control (CLC) to improve conditioning performance throughout the life of a pad and disk pair. Measured pad conditioner torque is used to monitor and control the conditioning and polish processes in situ and in real time. The CLC system maintains process performance throughout pad life by adjusting the conditioner down force to compensate for process drift, such as the loss of diamond aggressiveness as the disk ages.
Archive | 2006
Shou-sung Chang; Stan D. Tsai; Donald J. K. Olgado; Liang-Yuh Chen; Alain Duboust; Ralph M. Wadensweiler
Archive | 2006
Alain Duboust; Shou-sung Chang; Wei Lu; Siew Neo; Yan Wang; Antoine P. Manens; Yongsik Moon
Archive | 2009
Roy C. Nangoy; Shou-sung Chang; Donald J. K. Olgado; Hung Chih Chen; Gerald John Alonzo
Archive | 2004
Yan Wang; Siew Neo; Feng Liu; Stan D. Tsai; Yongqi Hu; Alain Duboust; Antoine P. Manens; Ralph M. Wadensweiler; Rashid Mavliev; Liang-Yuh Chen; Donald J. K. Olgado; Paul D. Butterfield; Ming-Kuei Tseng; Shou-sung Chang; Lizhong Sun
Archive | 2004
Yongqi Hu; Stan D. Tsai; Feng Q. Liu; Liang-Yuh Chen; Ralph M. Wadensweiler; Paul D. Butterfield; Donald J. K. Olgado; Martin S. Wohlert; Sen-Hou Ko; Shou-sung Chang
Archive | 2008
Sameer Deshpande; Shou-sung Chang; Hung Chih Chen; Roy C. Nangoy; Stan D. Tsai
Archive | 2008
Eashwer Kollata; Shou-sung Chang; Zhenhua Zhang; Paul D. Butterfield; Sen-Hou Ko; Antoine P. Manens; Gary C. Ettinger; Ricardo Martinez
Archive | 2008
Gary C. Ettinger; Paul D. Butterfield; Antoine P. Manens; Zhenhua Zhang; Eashwer Kollata; Shou-sung Chang
Archive | 2004
Stan D. Tsai; Shou-sung Chang; Liang-Yuh Chen
