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Epple Alexander

Carl Zeiss AG

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Archive | 2004

PROJECTION OBJECTIVELENS FOR MICRO LITHOGRAPHY OR THE LIKE, AND METHOD FOR ADJUSTING PROJECTION OBJECTIVE LENS

Epple Alexander; Graeupner Paul; Kaiser Winfried; Garreis Reiner; Ulrich Wilhelm

Archive | 2002

SPLIT TYPE OBJECTIVE LENS FOR ILLUMINATION SYSTEM

Schultz Joerg; Epple Alexander; Sohmer Alexander; Wangler Johanness; Grunwald Juergen

Archive | 2016

Projection exposure apparatus

Epple Alexander

Archive | 2014

Projection optics for forming object field of optics plane in projection exposure system for microlithography, has blinding unit presetting outer boundary of optics with respect to diaphragm direction that is set parallel to planes

Epple Alexander

Archive | 2002

PROJECTION LENS AND METHOD OF MANUFACTURING PART HAVING VERY FINE STRUCTURE

Schuster Karl-Heinz; Epple Alexander

Archive | 2008

Catadioptric projection objective with pupil mirror

Epple Alexander

Archive | 2005

REFRACTIVE PROJECTION OBJECTIVE LENS FOR IMMERSION LITHOGRAPHY

Rostalski Hans-Juergen; Dodoc Aurelian; Epple Alexander; Beierl Helmut

Archive | 2003

Projection lighting system for imaging one object near another such as in lithographic printing processes having different lens groups of selected materials

Schuster Karl-Heinz; Ulrich Wilhelm; Gruner Toralf; Kraehmer Daniel; Singer Wolfgang; Epple Alexander; Beierl Helmut; Garreis Reiner

Archive | 2008

Projection objective with conjugated pupils

Epple Alexander

Archive | 2007

Projection exposure system operating method involves applying illumination system during utilization phase, where illumination system is designed for producing rectangular field

Epple Alexander

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Collaboration

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Dodoc Aurelian

Carl Zeiss AG

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Ulrich Wilhelm

Carl Zeiss AG

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Beierl Helmut

Carl Zeiss AG

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Garreis Reiner

Carl Zeiss AG

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Schultz Joerg

Carl Zeiss AG

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Sohmer Alexander

Carl Zeiss AG

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Feldmann Heiko

Carl Zeiss AG

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Gruner Toralf

Carl Zeiss AG

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Kaiser Winfried

Carl Zeiss AG

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Mann Hans-Juergen

Carl Zeiss AG

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