Eugene Shifrin
KLA-Tencor
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Publication
Featured researches published by Eugene Shifrin.
Metrology, Inspection, and Process Control for Microlithography XI | 1997
Anatoly Shchemelinin; Eugene Shifrin; Alexander I. Zaslavsky
The basic challenges of optical overlay measurements are discussed. It is shown that overlay measurement precision is determined by optical resolution, signal to noise ratio of the measurement system and properties of the overlay target. Some tips for better overlay target design ad hardware improvement are formulated. It is shown that an interferometer based measurement system allows better accuracy than the brightfield one. It is shown that for current measurement techniques, 130 nm design rule requirements can be met.
Archive | 2007
Ashok Kulkarni; Brian Duffy; Kais Maayah; Gordon Rouse; Eugene Shifrin
Archive | 2012
Mohan Mahadevan; Govind Thattaisundaram; Ajay Gupta; Chien-Huei Chen; Jason Kirkwood; Ashok Kulkarni; Songnian Rong; Ernesto Escorcia; Eugene Shifrin
Archive | 2013
Ilya Bezel; Anatoly Shchemelinin; Eugene Shifrin; Matthew A. Panzer; Matthew Derstine; Jincheng Wang; Anant Chimmalgi; Rajeev Patil; Rudolf Brunner
Archive | 2010
Ilya Bezel; Anotoly Shchemelinin; Eugene Shifrin; Matthew Derstine
Archive | 2007
Chien-Huei (Adam) Chen; Xiaoming Wang; Eugene Shifrin; Tsung-Pao Fang
Archive | 2010
Ilya Bezel; Anatoly Shchemelinin; Eugene Shifrin; Matthew Derstine; Richard Solarz
Archive | 2014
Eugene Shifrin; Ashok Kulkarni; Kris Bhaskar; Graham Michael Lynch; John Raymond Jordan; Chwen-Jiann Fang
Archive | 2014
Anatoly Shchemelinin; Ilya Bezel; Matthew A. Panzer; Eugene Shifrin
Archive | 2015
Qing Luo; Kenong Wu; Hucheng Lee; Lisheng Gao; Eugene Shifrin; Yan Xiong; Shuo Sun
