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Frank Seliger

GlobalFoundries

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Publication

Featured researches published by Frank Seliger.

Archive | 2010

Cap layer removal in a high-K metal gate stack by using an etch process

Ralf Richter; Frank Seliger; Martin Mazur

Archive | 2010

ENHANCED CAP LAYER INTEGRITY IN A HIGH-K METAL GATE STACK BY USING A HARD MASK FOR OFFSET SPACER PATTERNING

Markus Lenski; Kerstin Ruttloff; Martin Mazur; Frank Seliger; Ralf Otterbach

Archive | 2010

FORMING SEMICONDUCTOR RESISTORS IN A SEMICONDUCTOR DEVICE COMPRISING METAL GATES BY INCREASING ETCH RESISTIVITY OF THE RESISTORS

Jens Heinrich; Ralf Richter; Katja Steffen; Johannes Groschopf; Frank Seliger; Andreas Ott; Manfred Heinz; Andy Wei

Archive | 2010

Corner rounding in a replacement gate approach based on a sacrificial fill material applied prior to work function metal deposition

Jens Heinrich; Thomas Werner; Frank Seliger; Frank Richter

Archive | 2012

Sophisticated Gate Electrode Structures Formed by Cap Layer Removal with Reduced Loss of Embedded Strain-Inducing Semiconductor Material

Stephan Kronholz; Gunda Beernink; Markus Lenski; Frank Seliger; Frank Richter

Archive | 2009

Abtrag einer Deckschicht in einem Metallgatestapel mit großem ε unter Anwendung eines Ätzprozesses

Martin Mazur; Ralf Richter; Frank Seliger

Archive | 2010

CAP REMOVAL IN A HIGH-K METAL GATE ELECTRODE STRUCTURE BY USING A SACRIFICIAL FILL MATERIAL

Jens Heinrich; Frank Seliger; Ralf Richter; Markus Lenski

Archive | 2013

Methods of forming a semiconductor device while preventing or reducing loss of active area and/or isolation regions

Joachim Patzer; Frank Seliger; Markus Lenski; Stephan Kronholz

Archive | 2011

Verbesserte Deckschichtintegrität in einem Metallgatestapel mit großem ε durch Verwenden einer Hartmaske für die Abstandshalterstrukturierung

Markus Lenski; Kerstin Ruttloff; Martin Mazur; Frank Seliger; Ralf Otterbach

Archive | 2011

Kantenverrundung in einem Austauschgateverfahren auf der Grundlage eines Opferfüllmaterials, das vor der Abscheidung des Austrittsarbeitsmetalls aufgebracht wird

Jens Heinrich; Thomas Werner; Frank Seliger; Frank Richter

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Collaboration

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Ralf Richter

GlobalFoundries

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Markus Lenski

Advanced Micro Devices

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Frank Richter

GlobalFoundries

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Kerstin Ruttloff

GlobalFoundries

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Martin Mazur

GlobalFoundries

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Markus Lenski

Advanced Micro Devices

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Jens Heinrich

Advanced Micro Devices

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Jens Heinrich

Advanced Micro Devices

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Thomas Werner

GlobalFoundries

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Volker Jaschke

Advanced Micro Devices

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