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Dive into the research topics where Gaudenzio Meneghesso is active.

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Featured researches published by Gaudenzio Meneghesso.


IEEE Transactions on Electron Devices | 2004

Surface-related drain current dispersion effects in AlGaN-GaN HEMTs

Gaudenzio Meneghesso; G. Verzellesi; Roberto Pierobon; Fabiana Rampazzo; Alessandro Chini; Umesh K. Mishra; C. Canali; Enrico Zanoni

Drain current dispersion effects are investigated in AlGaN-GaN HEMTs by means of pulsed, transient, and small-signal measurements. Gate- and drain-lag effects characterized by time constants in the order of 10/sup -5/-10/sup -4/ s cause dispersion between dc and pulsed output characteristics when the gate or the drain voltage are pulsed. An activation energy of 0.3 eV is extracted from temperature-dependent gate-lag measurements. We show that two-dimensional numerical device simulations accounting only for polarization charges and donor-like traps at the ungated AlGaN surface can quantitatively reproduce all dispersion effects observed experimentally in the different pulsing modes, provided that the measured activation energy is adopted as the energetic distance of surface traps from the valence-band edge. Within this hypothesis, simulations show that surface traps behave as hole traps during transients, interacting with holes attracted at the AlGaN surface by the negative polarization charge.


Journal of Applied Physics | 2013

Efficiency droop in InGaN/GaN blue light-emitting diodes: Physical mechanisms and remedies

G. Verzellesi; Davide Saguatti; Matteo Meneghini; Francesco Bertazzi; Michele Goano; Gaudenzio Meneghesso; Enrico Zanoni

Physical mechanisms causing the efficiency droop in InGaN/GaN blue light-emitting diodes and remedies proposed for droop mitigation are classified and reviewed. Droop mechanisms taken into consideration are Auger recombination, reduced active volume effects, carrier delocalization, and carrier leakage. The latter can in turn be promoted by polarization charges, inefficient hole injection, asymmetry between electron and hole densities and transport properties, lateral current crowding, quantum-well overfly by ballistic electrons, defect-related tunneling, and saturation of radiative recombination. Reviewed droop remedies include increasing the thickness or number of the quantum wells, improving the lateral current uniformity, engineering the quantum barriers (including multi-layer and graded quantum barriers), using insertion or injection layers, engineering the electron-blocking layer (EBL) (including InAlN, graded, polarization-doped, and superlattice EBL), exploiting reversed polarization (by either inv...


IEEE Transactions on Device and Materials Reliability | 2008

A Review on the Reliability of GaN-Based LEDs

Matteo Meneghini; Lorenzo Roberto Trevisanello; Gaudenzio Meneghesso; Enrico Zanoni

We review the degradation mechanisms that limit the reliability of GaN-based light-emitting diodes (LEDs). We propose a set of specific experiments, which is aimed at separately analyzing the degradation of the properties of the active layer, of the ohmic contacts and of the package/phosphor system. In particular, we show the following: 1) low-current density stress can determine the degradation of the active layer of the devices, implying modifications of the charge/deep level distribution with subsequent increase of the nonradiative recombination components; 2) high-temperature storage can significantly affect the properties of the ohmic contacts and semiconductor layer at the p-side of the devices, thus determining emission crowding and subsequent optical power decrease; and 3) high-temperature stress can significantly limit the optical properties of the package of high-power LEDs for lighting applications.


IEEE Transactions on Electron Devices | 2010

A Review on the Physical Mechanisms That Limit the Reliability of GaN-Based LEDs

Matteo Meneghini; Augusto Tazzoli; Giovanna Mura; Gaudenzio Meneghesso; Enrico Zanoni

We review the failure modes and mechanisms of gallium nitride (GaN)-based light-emitting diodes (LEDs). A number of reliability tests are presented, and specific degradation mechanisms of state-of-the-art LED structures are analyzed. In particular, we report recent results concerning the following issues: 1) the degradation of the active layer induced by direct current stress due to the increase in nonradiative recombination; 2) the degradation of LEDs submitted to reverse-bias stress tests; 3) the catastrophic failure of advanced LED structures related to electrostatic discharge events; 4) the degradation of the ohmic contacts of GaN-based LEDs; and 5) the degradation of the optical properties of the package/phosphors system of white LEDs. The presented results provide important information on the weaknesses of LED technology and on the design of procedures for reliability evaluation. Results are compared with literature data throughout the text.


IEEE Transactions on Electron Devices | 2013

Deep-Level Characterization in GaN HEMTs-Part I: Advantages and Limitations of Drain Current Transient Measurements

Davide Bisi; Matteo Meneghini; Carlo De Santi; Alessandro Chini; M. Dammann; Peter Brückner; M. Mikulla; Gaudenzio Meneghesso; Enrico Zanoni

This paper critically investigates the advantages and limitations of the current-transient methods used for the study of the deep levels in GaN-based high-electron mobility transistors (HEMTs), by evaluating how the procedures adopted for measurement and data analysis can influence the results of the investigation. The article is divided in two parts within Part I. 1) We analyze how the choice of the measurement and analysis parameters (such as the voltage levels used to induce the trapping phenomena and monitor the current transients, the duration of the filling pulses, and the method used for the extrapolation of the time constants of the capture/emission processes) can influence the results of the drain current transient investigation and can provide information on the location of the trap levels responsible for current collapse. 2) We present a database of defects described in more than 60 papers on GaN technology, which can be used to extract information on the nature and origin of the trap levels responsible for current collapse in AlGaN/GaN HEMTs. Within Part II, we investigate how self-heating can modify the results of drain current transient measurements on the basis of combined experimental activity and device simulation.


IEEE Transactions on Device and Materials Reliability | 2008

Accelerated Life Test of High Brightness Light Emitting Diodes

Lorenzo Roberto Trevisanello; Matteo Meneghini; Giovanna Mura; Massimo Vanzi; Maura Pavesi; Gaudenzio Meneghesso; Enrico Zanoni

Short-term accelerated life test activity on high brightness light emitting diodes is reported. Two families of 1-W light-emitting diodes (LEDs) from different manufacturers were submitted to distinct stress conditions: high temperature storage without bias and high dc current test. During aging, degradation mechanisms like light output decay and electrical property worsening were detected. In particular, the degradation in light efficiency induced by thermal storage was found to follow an exponential law, and the activation energy of the process was extrapolated. Aged devices exhibited a modification of the package epoxy color from white to brown. The instability of the package contributes to the overall degradation in terms of optical and spectral properties. In addition, an increase in thermal resistance was detected on one family of LEDs. This increase induces higher junction temperature levels during operative conditions. In order to correlate the degradation mechanisms and kinetics found during thermal stress, a high dc current stress was performed. Results from this comparative analysis showed similar behavior, implying that the degradation process of dc current aged devices is thermal activated due to high temperatures reached by the junction during stress. Finally, the different effects of the stress on two families of LEDs were taken into account in order to identify the impact of aging on device structure.


IEEE Transactions on Electron Devices | 2006

Current Collapse and High-Electric-Field Reliability of Unpassivated GaN/AlGaN/GaN HEMTs

Gaudenzio Meneghesso; Fabiana Rampazzo; P. Kordoš; G. Verzellesi; Enrico Zanoni

Long-term ON-state and OFF-state high-electric-field stress results are presented for unpassivated GaN/AlGaN/GaN high-electron-mobility transistors on SiC substrates. Because of the thin GaN cap layer, devices show minimal current-collapse effects prior to high-electric-field stress, despite the fact that they are not passivated. This comes at the price of a relatively high gate-leakage current. Under the assumption that donor-like electron traps are present within the GaN cap, two-dimensional numerical device simulations provide an explanation for the influence of the GaN cap layer on current collapse and for the correlation between the latter and the gate-leakage current. Both ON-state and OFF-state stresses produce simultaneous current-collapse increase and gate-leakage-current decrease, which can be interpreted to be the result of gate-drain surface degradation and reduced gate electron injection. This study shows that although the thin GaN cap layer is effective in suppressing surface-related dispersion effects in virgin devices, it does not, per se, protect the device from high-electric-field degradation, and it should, to this aim, be adopted in conjunction with other technological solutions like surface passivation, prepassivation surface treatments, and/or field-plate gate


Applied Physics Letters | 2012

Time-dependent degradation of AlGaN/GaN high electron mobility transistors under reverse bias

Matteo Meneghini; Antonio Stocco; Marco Bertin; Denis Marcon; Alessandro Chini; Gaudenzio Meneghesso; Enrico Zanoni

This paper describes a detailed analysis of the time-dependent degradation kinetics of GaN-based high electron mobility transistors submitted to reverse-bias stress. We show that: (1) exposure to reverse-bias may induce recoverable changes in gate leakage and threshold voltage, due to the accumulation of negative charge within the AlGaN layer, and of positive charge at the AlGaN/GaN interface. (2) Permanent degradation consists in the generation of parasitic leakage paths. Several findings support the hypothesis that permanent degradation is due to a defect percolation process: (2(a)) for sufficiently long stress times, degradation occurs even below the “critical voltage” estimated by step stress experiments; (2(b)) before permanent degradation, gate current becomes noisy, indicating an increase in defect concentration; and (2(c)) time to breakdown strongly depends on the initial defectiveness of the samples.


IEEE Transactions on Electron Devices | 2008

Investigation of High-Electric-Field Degradation Effects in AlGaN/GaN HEMTs

M. Faqir; G. Verzellesi; Gaudenzio Meneghesso; Enrico Zanoni; F. Fantini

High-electric-field degradation phenomena are investigated in GaN-capped AlGaN/GaN HEMTs by comparing experimental data with numerical device simulations. Under power- and OFF-state conditions, 150-h DC stresses were carried out. Degradation effects characterizing both stress experiments were as follows: a drop in the dc drain current, the amplification of gate-lag effects, and a decrease in the reverse gate leakage current. Numerical simulations indicate that the simultaneous generation of surface (and/or barrier) and buffer traps can account for all of the aforementioned degradation modes. Experiments also showed that the power-state stress induced a drop in the transconductance at high gate-source voltages only, whereas the OFF-state stress led to a uniform transconductance drop over the entire gate-source-voltage range. This behavior can be reproduced by simulations provided that, under the power-state stress, traps are assumed to accumulate over a wide region extending laterally from the gate edge toward the drain contact, whereas, under the OFF-state stress, trap generation is supposed to take place in a narrower portion of the drain-access region close to the gate edge and to be accompanied by a significant degradation of the channel transport parameters.


IEEE Transactions on Device and Materials Reliability | 2008

Performance Degradation of High-Brightness Light Emitting Diodes Under DC and Pulsed Bias

Simone Buso; Giorgio Spiazzi; Matteo Meneghini; Gaudenzio Meneghesso

This paper presents the results of an experimental investigation of the performance of commercially available high-brightness light emitting diodes (HBLEDs). Three different families of white HBLEDs from three different manufacturers are considered. The main issues taken into account and reported in detail are the following: quality of the emitted light, impact of the driving strategy on the expected device lifetime, thermal management and related aging effects. The execution of a large number of accelerated stress tests reveals the weaknesses of the technology with respect to thermal degradation and the sensitivity of the device performance degradation to the adopted driving strategy. Furthermore, square-wave driving has been compared to conventional dc driving in terms of device performance and reliability. Comparison has been carried out for the same average current value of the driving waveforms. It has been found that square-wave driving can be an effective alternative to dc driving in terms of device efficiency only for high duty cycles. For low duty cycles, worse performance was detected due to the saturation of efficiency at high peak current levels. Reliability tests did not univocally indicate whether the use of pulsed bias can be more convenient than dc driving in terms of lumen maintenance. The three families of devices submitted to dc and pulsed stresses showed different behaviors, indicating that stress kinetics strongly depends on the LED technological structure and package thermal design.

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Alessandro Chini

University of Modena and Reggio Emilia

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Augusto Tazzoli

Carnegie Mellon University

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G. Verzellesi

University of Modena and Reggio Emilia

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