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Georg Roters

Infineon Technologies

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Publication

Featured researches published by Georg Roters.

Archive | 2003

Method for minimizing the vapor deposition of tungsten oxide during the selective side wall oxidation of tungsten-silicon gates

Olaf Storbeck; Wilhelm Kegel; Jens-Uwe Sachse; Michael Stadtmüller; Regina Hayn; Erwin Schoer; Georg Roters; Steffen Frigge

Archive | 2003

Device and method for thermally treating semiconductor wafers

Georg Roters; Steffen Frigge; Sing Pin Tay; Yao Zhi Hu; Regina Hayn; Jens-Uwe Sachse; Erwin Schoer; Wilhelm Kegel

International symposium on advanced short-time thermal processing for Si-based CMOS devices | 2003

Selective oxidation of tungsten-gate stacks in high-volume DRAM production

Georg Roters; Regina Hayn; Wilhelm Kegel; Olaf Storbeck; Steffen Frigge; Gerd Feldmeyer; Hans Joachim Meyer; Erwin Schroer

Archive | 2007

Method for improving interface reactions at semiconductor surfaces

Zsolt Nenyei; Thomas Theiler; Georg Roters; Hans-Joachim Meyer

Archive | 2002

Method for minimizing tungsten oxide evaporation during selective sidewall oxidation of tungsten-silicon gates

Steffen Frigge; Wilhelm Kegel; Jens-Uwe Sachse; Michael Stadtmüller; Regina Hayn; Georg Roters; Erwin Schoer; Olaf Storbeck

Archive | 2003

Vorrichtung und verfahren zum thermischen behandeln von halbleiterwafern

Georg Roters; Steffen Frigge; Sing Pin Tay; Yao Zhi Hu; Regina Hayn; Jens Uwe Sachse; Erwin Schoer; Wilhelm Kegel

Archive | 2002

Procede servant a minimiser l'evaporation de l'oxyde de tungstene au cours de l'oxydation selective de paroi laterale de portes tungstene-silicium

Steffen Frigge; Wilhelm Kegel; Jens-Uwe Sachse; Michael Stadtmueller; Regina Hayn; Georg Roters; Erwin Schoer; Olaf Storbeck

Archive | 2002

Apparatus and method for thermal treatment of semiconductor wafers

Steffen Frigge; Regina Hayn; Yao Zhi San Jose Hu; Wilhelm Kegel; Georg Roters; Jens-Uwe Sachse; Erwin Schoer; Sing Pin Fremont Tay

Archive | 2002

Verfahren zur minimierung der wolframoxidabscheidung bei der selektiven seitenwandoxidation von wolfram-silizium-gates A method for minimizing the wolframoxidabscheidung in the selective oxidation side wall of tungsten-silicon gates

Steffen Frigge; Wilhelm Kegel; Jens-Uwe Sachse; Michael Stadtmueller; Regina Hayn; Georg Roters; Erwin Schoer; Olaf Storbeck

Archive | 2002

Vorrichtung und Verfahren zum thermischen Behandeln von Halbleiterwafern Device and method for the thermal treatment of semiconductor wafers

Steffen Frigge; Regina Hayn; Yao Zhi San Jose Hu; Wilhelm Kegel; Georg Roters; Jens-Uwe Sachse; Erwin Schoer; Sing Pin Fremont Tay

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Collaboration

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Regina Hayn

Qimonda

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Steffen Frigge

Infineon Technologies

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Wilhelm Kegel

Infineon Technologies

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Erwin Schoer

Infineon Technologies

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Jens-Uwe Sachse

Infineon Technologies

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Olaf Storbeck

Qimonda

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Michael Stadtmueller

Infineon Technologies

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Michael Stadtmüller

Infineon Technologies

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Sing Pin Tay

Infineon Technologies

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Thomas Theiler

Mattson Technology

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