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Steffen Frigge

Infineon Technologies

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Publication

Featured researches published by Steffen Frigge.

Archive | 2003

Method for minimizing the vapor deposition of tungsten oxide during the selective side wall oxidation of tungsten-silicon gates

Olaf Storbeck; Wilhelm Kegel; Jens-Uwe Sachse; Michael Stadtmüller; Regina Hayn; Erwin Schoer; Georg Roters; Steffen Frigge

Archive | 2003

Device and method for thermally treating semiconductor wafers

Georg Roters; Steffen Frigge; Sing Pin Tay; Yao Zhi Hu; Regina Hayn; Jens-Uwe Sachse; Erwin Schoer; Wilhelm Kegel

Archive | 2011

Continuous furnace of substrate processing system, has heating unit and gas supply unit that are formed inside the interior spaces

Steffen Frigge; Marcel König; Mirko Meyer; Mirko Staude

International symposium on advanced short-time thermal processing for Si-based CMOS devices | 2003

Selective oxidation of tungsten-gate stacks in high-volume DRAM production

Georg Roters; Regina Hayn; Wilhelm Kegel; Olaf Storbeck; Steffen Frigge; Gerd Feldmeyer; Hans Joachim Meyer; Erwin Schroer

Archive | 2011

Transportation system for use in flowthrough system e.g. drying furnace, has insulating support provided with heating elements within isolation pipe, and channels provided in wall of isolation pipe for electrical contact of heating elements

Uwe Scheit; Mirko Meyer; Steffen Frigge; Mirko Staude

Archive | 2002

Method for minimizing tungsten oxide evaporation during selective sidewall oxidation of tungsten-silicon gates

Steffen Frigge; Wilhelm Kegel; Jens-Uwe Sachse; Michael Stadtmüller; Regina Hayn; Georg Roters; Erwin Schoer; Olaf Storbeck

Current Opinion in Chemical Biology | 2000

Influence of RTP Flash Anneal Ramp Rates on Lithography Overlay Performance on 300 mm integrated Wafers

Olaf Storbeck; Dietmar Ganz; M. Stadmuller; Steffen Frigge; W Lerch; Dieter Graef; Gunther Obermeier

Archive | 2012

Continuous heat treatment method of substrate for solar cell, involves operating transport rollers in groups such that each group of rollers has different substrate transport speeds and/or substrate transport velocity gradients

Steffen Frigge; Mirko Meyer; Mirko Staude

Archive | 2011

Flow-through system e.g. diffusion furnace, for heat treatment of glass panes in glass industry, has planar glass substrates comprising transport layers arranged one above other in process chamber, where substrates are processed by chamber

Uwe Scheit; Mirko Meyer; Steffen Frigge; Mirko Staude

Archive | 2011

Flowthrough system for processing substrate in atmosphere, has gas inlets and gas outlets arranged on line parallel to rollers, where one of gas outlets is fixed on channels at transport direction while other gas outlet is placed on chamber

Uwe Scheit; Steffen Frigge; Regina Hayn

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Regina Hayn

Qimonda

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Georg Roters

Infineon Technologies

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Wilhelm Kegel

Infineon Technologies

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Erwin Schoer

Infineon Technologies

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Jens-Uwe Sachse

Infineon Technologies

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Olaf Storbeck

Qimonda

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Michael Stadtmueller

Infineon Technologies

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Michael Stadtmüller

Infineon Technologies

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Sing Pin Tay

Infineon Technologies

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Jens Uwe Sachse

Infineon Technologies

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