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Dive into the research topics where Haowen Bu is active.

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Featured researches published by Haowen Bu.


IEEE Transactions on Semiconductor Manufacturing | 2005

Manufacturing benefits of disilane as a precursor for polycrystalline silicon films for the advanced CMOS gate electrode

Yuanning Chen; Haowen Bu; Stephanie Watts Butler; Kevin L. Cunningham; Shulin Wang; Bill Spicer

The polycrystalline silicon deposited by single-wafer rapid thermal chemical vapor deposition with both silane (SiH/sub 4/) and disilane (Si/sub 2/H/sub 6/) precursors have been characterized for across wafer uniformity, thickness repeatability, and basic material properties such as grain structure and surface topography. The results show that the disilane process greatly improves the manufacturability of the single-wafer polycrystalline silicon process. Specifically, a /spl sim/50% improvement in the thickness uniformity, /spl sim/25% improvement in surface roughness, and a significantly less sensitivity of the process to hardware have been achieved with similar particle performance. The grain structure of as-deposited and postimplant and anneal films have been compared by X-ray diffraction and transmission electron microscope. NMOS and PMOS capacitors have been fabricated with polycrystalline silicon using silane and disilane precursors. The grain structure and electrical parameters, such as gate leakage currents and gate capacitance, show no significant difference between these two precursors.


Archive | 2002

Reduction of seed layer roughness for use in forming SiGe gate electrode

Haowen Bu; Stephanie Watts Butler; Rajesh Khamankar; Hiroaki Niimi


Archive | 2002

SOURCE DRAIN AND EXTENSION DOPANT CONCENTRATION

Haowen Bu; Amitabh Jain; Wayne Bather; Stephanie Watts Butler


Archive | 2006

CMOS transistors and methods of forming same

Haowen Bu; Brian Hornung; Periannan Chidambaram; Amitabh Jain; Rajesh Khamankar; Nandu Mahalingam; Srinivansan Chakravarthi


Archive | 2003

Reduced hydrogen sidewall spacer oxide

Haowen Bu; Clinton L. Montgomery; Amitabh Jain


Meeting Abstracts | 2008

The Impact of Carbon on the Warpage of e-SiGe Wafers During Laser Anneal

Deborah J. Riley; Haowen Bu; Amitabh Jain; Rajesh Khamankar


Archive | 2005

Improved cmos transistors and methods of forming same

Haowen Bu; Brian Hornung; Periannan Chidambaram; Amitabh Jain; Rajesh Khamankar; Nandu Mahalingam; Chakravarthi Srinivasan


Archive | 2006

Implants à base d’azote pour la réduction de défauts dans du silicium contraint

Srinivasan Chakravarthi; Periannan Chidambaram; Rajesh Khamankar; Haowen Bu; Douglas T. Grider


Archive | 2006

Stickstoffbasierte implantate zur fehlerverringerung in verspanntem silizium

Srinivasan Chakravarthi; Periannan Chidambaram; Rajesh Khamankar; Haowen Bu; Douglas T. Grider


Archive | 2005

Transistors cmos haute performance a contrainte lineaire de dielectrique premetallique (pmd)

Haowen Bu; Rajesh Khamankar; Douglas T. Grider

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