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Haruki Nojo

Air Products & Chemicals

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Publication

Featured researches published by Haruki Nojo.

Archive | 2004

Periodic Acid Compositions For Polishing Ruthenium/Low K Substrates

Robert J. Small; Haruki Nojo; Kenichi Orui; Steve Masami Aragaki; Atsushi Hayashida

Archive | 2001

COLLOIDAL SILICA FOR POLISHING SURFACE WHEREIN METAL FILM AND INSULATION FILM COEXIST

Haruki Nojo; Akitoshi Yoshida; 明利 吉田; 治輝 能條

Archive | 2005

Slurry, chemical mechanical polishing method using the slurry, and method of forming a surface of a capacitor using the slurry

Seong-Kyu Yun; Kenichi Orui; Chang-ki Hong; Jae-dong Lee; Sung-Jun Kim; Haruki Nojo

Archive | 2002

Cerium oxide slurry, and method of manufacturing substrate

Haruki Nojo; Akitoshi Yoshida; Pascal Berar

Archive | 2005

Polishing method to reduce dishing of tungsten on a dielectric

Haruki Nojo; Yoshibumi Suzuki

Archive | 2003

Abrasive powder composition, and manufacturing method of semiconductor substrate

Kunikiyo Matsumoto; Kiyoyasu Miura; Haruki Nojo; Kenichi Orui; 淳靖 三浦; 健一 大類; 訓己世 松本; 治輝 能條

Archive | 2004

A slurry composition and a polishing method using the same

Haruki Nojo; Akitoshi Yoshida; Hirofumi Kashihara; Pascal Berar

Archive | 2003

Chemical mechanical polishing composition and process

Haruki Nojo; Akitoshi Yoshida; Hirofumi Kashihara; Pascal Berar

Archive | 2006

Composition of polishing solution for semiconductor substrate

Hirofumi Kashiwabara; Haruki Nojo; Masami Shirota; Yasuhiro Yoneda; 真美 代田; 洋文 柏原; 康洋 米田; 治輝 能條

Meeting Abstracts | 2006

Development of Ru CMP Slurry and its Application to the Node Separation of RIR Capacitor

Seong-Kyu Yun; Jae-dong Lee; Kenichi Orui; Haruki Nojo; Bo Un Yoon; Chang-ki Hong; Han-Ku Cho; Joo-Tae Moon

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Akitoshi Yoshida

Air Products

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Pascal Berar

Air Products

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Kenichi Orui

Air Products

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Chang-ki Hong

Samsung

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Jae-dong Lee

Samsung

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Seong-Kyu Yun

Samsung

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Hirofumi Kashihara

Air Products

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Bo Un Yoon

Samsung

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Han-Ku Cho

Samsung

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Joo-Tae Moon

Samsung

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