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Hata Mitsuhiro

Samsung

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Featured researches published by Hata Mitsuhiro.

international microprocesses and nanotechnology conference | 2003

Most efficient alternative as a way of sub-80 nm contact holes and trenches formation

Jung Hwan Hah; Jin-Young Yoon; Hata Mitsuhiro; Hyun-woo Kim; Sang-Gyun Woo; Han-Ku Cho; Woo-Sung Han

In this paper, we compared three processes to confirm their feasibility and extract the weak and strong aspects of each process. Each process was evaluated with a mask having 1:1 square array and the isolated contact hole patterns of various contact CD and pitches and then its appropriate or best layout was determined or recommended for real device application.

Archive | 2005

Mask pattern for semiconductor device fabrication, method of forming the same, and method of fabricating finely patterned semiconductor device

Jung-Hwan Hah; Jin Hong; Hyun-woo Kim; Hata Mitsuhiro; Kolake Mayya Subramanya; Sang-Gyun Woo

Archive | 2006

MASK PATTERN FOR MANUFACTURING SEMICONDUCTOR DEVICE AND FORMING METHOD THEREOF, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE WITH FINE PATTERN

Hah Jung-Hwan; Kim Hyun Woo; Hata Mitsuhiro; Woo Sang-Gyun

Archive | 2005

Mask pattern for manufacturing semiconductor device and its forming method, method for manufacturing coating composition for forming micropattern, and method for manufacturing semiconductor device

Hata Mitsuhiro; Hah Jung-Hwan; Kim Hyun Woo; Woo Sanggyun

Archive | 2006

BOTTOM LAYER RESIST POLYMER FOR PHOTOLITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME

Hata Mitsuhiro; Woo Sang-Gyun; Kang Yool; Ryoo Man-Hyoung; Kim Hyun Woo; Hah Jung-Hwan

Archive | 2006

TOP COATING COMPOSITION FOR PHOTORESIST AND METHOD FOR FORMING PHOTORESIST PATTERN

Hata Mitsuhiro; Ryoo Man Hyoung; Kim Hyun Woo; Woo Sang Gyun; Hah Jung Hwan; Yoon Jin Young

Archive | 2006

Bottom layer resist polymers for photolithography and methods of manufacturing the same

Hata Mitsuhiro; Woo Sang-Gyun; Kang Yool; Ryoo Man-Hyoung; Kim Hyun-Woo; Hah Jung-Hwan

Archive | 2006

DOUBLE PHOTO LITHOGRAPHY METHOD WITHOUT INTERMIXING

Kang Yool; Cho Han Ku; Woo Sang Gyun; Lee Suk Joo; Hata Mitsuhiro; Lee Hyung Rae; Ryoo Man Hyoung

Archive | 2007

POLYMER FOR TOP COATING LAYER, TOP COATING SOLUTION COMPOSITIONS AND IMMERSION LITHOGRAPHY PROCESS USING THE SAME

Hata Mitsuhiro; Choi Sang Jun; Woo Sang Gyun; Ryoo Man Hyoung

Archive | 2007

COATING COMPOSITION FOR FORMING ETCH MASK PATTERN AND METHOD OF FORMING FINE PATTERN FOR SEMICONDUCTOR DEVICE

Choi Sang Jun; Hata Mitsuhiro; Ryoo Man Hyoung; Hah Jung Hwan

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Hah Jung-Hwan

Samsung

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Woo Sang-Gyun

Samsung

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Hyun-woo Kim

Samsung

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Ryoo Man-Hyoung

Samsung

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Sang-Gyun Woo

Samsung

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Han-Ku Cho

Samsung

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Jin Hong

Samsung

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Jin-Young Yoon

Samsung

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Jung Hwan Hah

Samsung

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Jung-Hwan Hah

Samsung

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