Henning Haffner

Dummy feature reduction using optical proximity effect correction

Optimized decoupling capacitor using lithographic dummy filler

Generating cut mask for double-patterning process

METHODOLOGY OF PLACING PRINTING ASSIST FEATURE FOR RANDOM MASK LAYOUT

CALIBRATION AND VERIFICATAION STRUCTURES FOR USE IN OPTICAL PROXIMITY CORRECTION

Mask and method for patterning a semiconductor wafer

Contact Level Mask Layouts By Introducing Anisotropic Sub-Resolution Assist Features

MEEF REDUCTION BY ELONGATION OF SQUARE SHAPES

Method of using optical proximity effects to create electrically blown fuses with sub-critical dimension neck downs

MASK LAYOUT FORMATION