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Publication
Featured researches published by Henry John Geipel.
IEEE Journal of Solid-state Circuits | 1979
Henry John Geipel; Andres G. Fortino
An empirically based process modeling system is discussed for determining ion-implant conditions used to achieve specific IGFET thresholds. Experimental techniques are applied to insure consistency between physical process phenomenon and the numerical algorithms employed. Device threshold design results are presented for active and parasitic IGFETs in a dual polysilicon-gate technology. The utility of this design procedure in multistep processes for determining the effects of various parameters such as screen thickness, final peak concentration, dose, and energy are considered.
Archive | 1981
Paul E. Bakeman; Andres G. Fortino; Henry John Geipel; Jeffrey Patrick Kasold; Robert Michael Quinn
Archive | 1979
Andres G. Fortino; Henry John Geipel; Lawrence Griffith Heller; Ronald Silverman
Archive | 1982
Peter E. Cottrell; Henry John Geipel
Archive | 1986
Paul E. Bakeman; Henry John Geipel
Archive | 1981
Henry John Geipel; Ning Hsieh; Charles W. Koburger; Larry Alan Nesbit
Archive | 1981
Henry John Geipel; Larry Alan Nesbit
Archive | 1980
Henry John Geipel; Richard Bruce Shasteen
Archive | 1982
Henry John Geipel; Ning Hsieh; Iii Charles William Koburger; Larry Alan Nesbit
Archive | 1982
Peter E. Cottrell; Henry John Geipel; Donald M. Kenney
