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Masashi Iio

Shin-Etsu Chemical

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Publication

Featured researches published by Masashi Iio.

Archive | 2009

Positive resist composition and patterning process

Tsunehiro Nishi; Takeshi Kinsho; Masaki Ohashi; Koji Hasegawa; Masashi Iio

Archive | 2010

Resist-modifying composition and pattern forming process

Takeru Watanabe; Kazuhiro Katayama; Masashi Iio; Jun Hatakeyama; Tsunehiro Nishi; Takeshi Kinsho

Archive | 2010

PATTERN FORMING PROCESS, CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION, AND RESIST-MODIFYING COMPOSITION

Takeru Watanabe; Tsunehiro Nishi; Masashi Iio

Archive | 2010

Pattern forming process and resist-modifying composition

Takeru Watanabe; Masashi Iio; Jun Hatakeyama; Tsunehiro Nishi; Yoshio Kawai

Archive | 2015

Silicone structure-bearing polymer, negative resist composition, photo-curable dry film, patterning process, and electric/electronic part-protecting film

Katsuya Takemura; Hiroyuki Urano; Masashi Iio; Takayuki Fujiwara; Koji Hasegawa

Archive | 2014

NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS USING SAME

Jun Hatakeyama; Hiroyuki Urano; Masashi Iio

Archive | 2014

Polymer compound, chemically amplified negative resist composition, photo-curable dry film and production method thereof, layered product, patterning process, and substrate

Hiroyuki Urano; Masashi Iio; Katsuya Takemura; Takashi Miyazaki

Archive | 2015

Silicone skeleton-containing polymer compound and method for producing same, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, and substrate

Hiroyuki Urano; Masashi Iio; Katsuya Takemura; Koji Hasegawa; Masahiro Fukushima; Takayuki Fujiwara

Archive | 2018

TETRACARBOXYLIC ACID DIESTER COMPOUND, POLYMER OF POLYIMIDE PRECURSOR AND METHOD FOR PRODUCING SAME, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING CURED FILM

Hiroyuki Urano; Katsuya Takemura; Masashi Iio; Koji Hasegawa; Kenji Funatsu

Archive | 2015

POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTO-CURABLE DRY FILM AND METHOD FOR PRODUCING SAME, LAYERED PRODUCT, PATTERNING PROCESS, AND SUBSTRATE

Katsuya Takemura; Masashi Iio; Hiroyuki Urano; Takashi Miyazaki

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Collaboration

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Hiroyuki Urano

Shin-Etsu Chemical

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Katsuya Takemura

Panasonic

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Koji Hasegawa

Shin-Etsu Chemical

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Takayuki Fujiwara

Shin-Etsu Chemical

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Tsunehiro Nishi

Shin-Etsu Chemical

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Jun Hatakeyama

Shin-Etsu Chemical

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Masahiro Fukushima

Shin-Etsu Chemical

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Takashi Miyazaki

Shin-Etsu Chemical

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Takeru Watanabe

Shin-Etsu Chemical

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Takeshi Kinsho

Shin-Etsu Chemical

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