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Dive into the research topics where Hisataka Minami is active.

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Featured researches published by Hisataka Minami.


Proceedings of International Conference on Planarization/CMP Technology 2014 | 2014

Nano size cerium hydroxide slurry for scratch-free CMP process

Takaaki Tanaka; Hisataka Minami; Toshiaki Akutsu; Tomohiro Iwano; Takahiro Hidaka; Takashi Shinoda; Haruaki Sakurai; Shigeru Nobe

We report recent progress in a novel cerium hydroxide polishing slurry with particle size of about 5 nm nano size cerium hydroxide (NSC) abrasive. NSC has succeeded in omitting particles over 1 μm, and in reducing scratches to 1/30 of those with calcined ceria slurry. Even though, NSC maintains oxide removal rate similar to conventional ceria. Mixing NSC with the specific additives brought out tunable polishing of SiO2, SiN, and poly-Si.


Archive | 2013

POLISHING AGENT, POLISHING AGENT SET, AND SUBSTRATE POLISHING METHOD

Toshiaki Akutsu; Hisataka Minami; Tomohiro Iwano; Koji Fujisaki


Archive | 2012

Cmp polishing fluid, method for manufacturing same, method for manufacturing composite particle, and method for polishing base material

Hisataka Minami; Keisuke Inoue; Chisato Kikkawa; Yutaka Nomura; Tomohiro Iwano


Archive | 2008

CMP POLISHING LIQUID AND METHOD FOR POLISHING SUBSTRATE USING THE SAME

Hisataka Minami; Hiroshi Ono; Jin Amanokura


Archive | 2015

Polishing agent, polishing agent set and method for polishing base

Toshiaki Akutsu; Hisataka Minami; Tomohiro Iwano; Koji Fujisaki


Archive | 2009

Polishing solution for cmp, and method for polishing substrate using the polishing solution for cmp

Hisataka Minami; Ryouta Saisyo; Hiroshi Ono


Archive | 2009

Metal polishing liquid and polishing method using the polishing liquid

Hitoshi Amanokura; Naoyuki Koyama; Hisataka Minami; 久貴 南; 仁 天野倉; 直之 小山


Archive | 2013

Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate

Tomohiro Iwano; 友洋 岩野; Hisataka Minami; 久貴 南; Toshiaki Akutsu; 利明 阿久津; Koji Fujisaki; 耕司 藤崎


Archive | 2013

METHOD FOR PRODUCING ABRASIVE GRAINS, METHOD FOR PRODUCING SLURRY, AND METHOD FOR PRODUCING POLISHING LIQUID

Tomohiro Iwano; Hisataka Minami; Hirotaka Akimoto


Archive | 2010

CMP Fluid and Method for Polishing Palladium

Hisataka Minami; Ryouta Saisyo; Jin Amanokura; Yuuhei Okada; Hiroshi Ono

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