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久貴 南

Hitachi

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Publication

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Archive | 2009

Metal polishing liquid and polishing method using the polishing liquid

Hitoshi Amanokura; Naoyuki Koyama; Hisataka Minami; 久貴 南; 仁 天野倉; 直之 小山

Archive | 2013

Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate

Tomohiro Iwano; 友洋 岩野; Hisataka Minami; 久貴 南; Toshiaki Akutsu; 利明 阿久津; Koji Fujisaki; 耕司 藤崎

Archive | 2014

Abrasive, abrasive set, and method for polishing substrate

久貴 南; 友洋 岩野; 利明 阿久津

Archive | 2013

砥粒、スラリー、研磨液及びこれらの製造方法

友洋 岩野; 久貴 南; 利明 阿久津; 耕司 藤崎

Archive | 2013

Slurry, polishing liquid set, the polishing method of polishing liquid and the substrate

友洋 岩野; 久貴 南; 利明 阿久津; 耕司 藤崎

Archive | 2013

The method of manufacturing abrasive grains, method for producing a slurry of a manufacturing method and a polishing liquid

友洋 岩野; 久貴 南; 利明 阿久津; 耕司 藤崎

Archive | 2013

CMP POLISHING LIQUID FOR PALLADIUM POLISHING AND POLISHING METHOD

Hisataka Minami; 久貴 南; Ryota Zeisho; 亮太 税所; Hitoshi Amanokura; 仁 天野倉; Yuhei Okada; 悠平 岡田; Yutaka Ono; 裕 小野

Archive | 2013

スラリー、研磨液セット、研磨液、基板の研磨方法及び基板

友洋 岩野; 久貴 南; 利明 阿久津; 耕司 藤崎

Archive | 2012

Ｃｍｐ研磨液及びその製造方法、複合粒子の製造方法、並びに基体の研磨方法

Hisataka Minami; 久貴 南; Keisuke Inoue; 井上 恵介; Chisato Kikkawa; 知里 吉川; Yutaka Nomura; 野村 豊; Tomohiro Iwano; 友洋 岩野

Archive | 2010

Fluide de polissage chimico-mecanique pour polir du palladium et procede de polissage

Hisataka Minami; 久貴 南; Yuuhei Okada; 悠平 岡田

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友洋 岩野

Hitachi

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Hisataka Minami

Hitachi

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Tomohiro Iwano

Hitachi

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Chisato Kikkawa

Hitachi

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Keisuke Inoue

Hitachi

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Koji Fujisaki

Hitachi

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Toshiaki Akutsu

Hitachi

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Yutaka Nomura

Hitachi

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Yuuhei Okada

Hitachi

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Naoyuki Koyama

University of Tokyo

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