Toshiaki Akutsu
Hitachi
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Publication
Featured researches published by Toshiaki Akutsu.
Proceedings of International Conference on Planarization/CMP Technology 2014 | 2014
Takaaki Tanaka; Hisataka Minami; Toshiaki Akutsu; Tomohiro Iwano; Takahiro Hidaka; Takashi Shinoda; Haruaki Sakurai; Shigeru Nobe
We report recent progress in a novel cerium hydroxide polishing slurry with particle size of about 5 nm nano size cerium hydroxide (NSC) abrasive. NSC has succeeded in omitting particles over 1 μm, and in reducing scratches to 1/30 of those with calcined ceria slurry. Even though, NSC maintains oxide removal rate similar to conventional ceria. Mixing NSC with the specific additives brought out tunable polishing of SiO2, SiN, and poly-Si.
Archive | 2005
Masato Fukasawa; Naoyuki Hitachi Chemical Co. Ltd. Koyama; Yasushi Kurata; Kouji Hitachi Chemical Co. Ltd. Haga; Toshiaki Akutsu; Yuuto Ootsuki
Archive | 2005
Masato Fukasawa; Naoyuki Koyama; Kouji Haga; Toshiaki Akutsu
Archive | 2010
Takashi Shinoda; Kazuhiro Enomoto; Toshiaki Akutsu
Archive | 2006
Masaya Nishiyama; Kazuhiro Enomoto; Masato Fukasawa; Toshiaki Akutsu; Yuuto Otsuki; Toranosuke Ashizawa
Archive | 2013
Toshiaki Akutsu; Hisataka Minami; Tomohiro Iwano; Koji Fujisaki
Archive | 2006
Masaya Nishiyama; Masato Fukasawa; Toshiaki Akutsu; Kazuhiro Enomoto; Toranosuke Ashizawa; Yuuto Ootsuki
Archive | 2015
Toshiaki Akutsu; Hisataka Minami; Tomohiro Iwano; Koji Fujisaki
Archive | 2013
Tomohiro Iwano; 友洋 岩野; Hisataka Minami; 久貴 南; Toshiaki Akutsu; 利明 阿久津; Koji Fujisaki; 耕司 藤崎
Archive | 2013
Hisataka Minami; Toshiaki Akutsu; Tomohiro Iwano; Koji Fujisaki
