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Ichirota Nagahama

Ebara Corporation

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Publication

Featured researches published by Ichirota Nagahama.

Archive | 2001

Inspection system by charged particle beam and method of manufacturing devices using the system

Mamoru Nakasuji; Nobuharu Noji; Tohru Satake; Masahiro Hatakeyama; Toshifumi Kimba; Hiroshi Sobukawa; Shoji Yoshikawa; Takeshi Murakami; Kenji Watanabe; Tsutomu Karimata; Shin Oowada; Mutsumi Saito; Yuichiro Yamazaki; Takamitsu Nagai; Ichirota Nagahama

Archive | 2003

Electron beam apparatus and device manufacturing method using same

Ichirota Nagahama; Yuichiro Yamazaki; Kenji Watanabe; Masahiro Hatakeyama; Tohru Satake; Nobuharu Noji

Archive | 2008

Electron beam inspection system and inspection method and method of manufacturing devices using the system

Kenji Watanabe; Hirosi Sobukawa; Nobuharu Noji; Tohru Satake; Shoji Yoshikawa; Tsutomu Karimata; Mamoru Nakasuji; Masahiro Hatakeyama; Takeshi Murakami; Yuichiro Yamazaki; Ichirota Nagahama; Takamitsu Nagai; Kazuyoshi Sugihara

Archive | 2001

Charged particle beam inspection apparatus and method for fabricating device using that inspection apparatus

Mamoru Nakasuji; Nobuharu Noji; Tohru Satake; Masahiro Hatakeyama; Toshifumi Kimba; Hirosi Sobukawa; Shoji Yoshikawa; Takeshi Murakami; Kenji Watanabe; Tsutomu Karimata; Shin Oowada; Mutsumi Saito; Yuichiro Yamazaki; Takamitsu Nagai; Ichirota Nagahama

Archive | 2007

Electron beam apparatus with detailed observation function and sample inspecting and observing method using electron beam apparatus

Kenji Watanabe; Tohru Satake; Nobuharu Noji; Takeshi Murakami; Tsutomu Karimata; Yuichiro Yamazaki; Ichirota Nagahama; Atsushi Onishi

Archive | 2007

Electron beam apparatus and an aberration correction optical apparatus

Masahiro Hatakeyama; Takeshi Murakami; Nobuharu Noji; Mamoru Nakasuji; Hirosi Sobukawa; Satoshi Mori; Tsutomu Karimata; Yuichiro Yamazaki; Ichirota Nagahama

Archive | 2001

Inspection apparatus and inspection method with electron beam, and device manufacturing method comprising the inspection apparatus

Yuichiro Yamazaki; Kenji Watanabe; Hirosi Sobukawa; Nobuharu Noji; Tohru Satake; Shoji Yoshikawa; Tsutomu Karimata; Mamoru Nakasuji; Masahiro Hatakeyama; Takeshi Murakami; Ichirota Nagahama; Takamitsu Nagai; Kazuyoshi Sugihara

Archive | 2004

Mapping-projection-type electron beam apparatus for inspecting sample by using electrons reflected from the sample

Kenji Watanabe; Takeshi Murakami; Masahiro Hatakeyama; Yoshinao Hirabayashi; Tohru Satake; Nobuharu Noji; Yuichiro Yamazaki; Ichirota Nagahama

Archive | 2002

Detecting apparatus and device manufacturing method

Masahiro Hatakeyama; Takeshi Murakami; Tohru Satake; Nobuharu Noji; Ichirota Nagahama; Yuichiro Yamazaki

Archive | 2002

Apparatus for detecting a fine geometry on a surface of a sample and method of manufacturing a semiconductor device

Masahiro Hatakeyama; Takeshi Murakami; Ichirota Nagahama; Nobuharu Noji; Tohru Satake; Yuichiro Yamazaki

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Nobuharu Noji

Ebara Corporation

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Yuichiro Yamazaki

Ebara Corporation

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Masahiro Hatakeyama

Ebara Corporation

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Takeshi Murakami

Ebara Corporation

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Tohru Satake

Ebara Corporation

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Kenji Watanabe

Ebara Corporation

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Tsutomu Karimata

Ebara Corporation

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Mamoru Nakasuji

Ebara Corporation

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Hirosi Sobukawa

Ebara Corporation

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Shoji Yoshikawa

Ebara Corporation

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