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Featured researches published by Ilya Perlov.


Archive | 1986

Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process

David Nin-Kou Wang; John M. White; Kam S. Law; Cissy Leung; Salvador P. Umotoy; Kenneth S. Collins; John A. Adamik; Ilya Perlov; Dan Maydan


Archive | 1988

CVD of silicon oxide using TEOS decomposition and in-situ planarization process

David Nin-Kou Wang; John M. White; Kam S. Law; Cissy Leung; Salvador P. Umotoy; Kenneth S. Collins; John A. Adamik; Ilya Perlov; Dan Maydan


Archive | 1996

Chemical vapor deposition chamber

Lawrence Chung-Lai Lei; Ilya Perlov; Karl A. Littau; Alan F. Morrison; Mei Chang; Ashok K. Sinha


Archive | 1995

Continuous processing system for chemical mechanical polishing

Robert D. Tolles; Norm Shendon; Sasson Somekh; Ilya Perlov; Eugene Gantvarg; Harry Q. Lee


Archive | 1988

Process for PECVD of silicon oxide using TEOS decomposition

David Nin-Kou Wang; John M. White; Kam S. Law; Cissy Leung; Salvador P. Umotoy; Kenneth S. Collins; John A. Adamik; Ilya Perlov; Dan Maydan


Archive | 1991

Plasma-enhanced CVD process using TEOS for depositing silicon oxide

David Nin-Kou Wang; John M. White; Kam S. Law; Cissy Leung; Salvador P. Umotoy; Kenneth S. Collins; John A. Adamik; Ilya Perlov; Dan Maydan


Archive | 1994

Chemical vapor deposition chamber with a purge guide

Lawrence C. Lei; Ilya Perlov; Karl A. Littau; Alan F. Morrison; Mei Chang; Ashok K. Sinha


Archive | 1995

Susceptor drive and wafer displacement mechanism

Ilya Perlov


Archive | 1995

Radially oscillating carousel processing system for chemical mechanical polishing

Ilya Perlov; Eugene Gantvarg; Harry Q. Lee; Sasson Somekh; Robert D. Tolles


Archive | 1994

Chemical vapor deposition of a thin film onto a substrate

Ashok K. Sinha; Mei Chang; Ilya Perlov; Karl A. Littau; Alan F. Morrison; Lawrence Chung-Lai Lei

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