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Dive into the research topics where Salvador P. Umotoy is active.

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Featured researches published by Salvador P. Umotoy.


Archive | 1986

Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process

David Nin-Kou Wang; John M. White; Kam S. Law; Cissy Leung; Salvador P. Umotoy; Kenneth S. Collins; John A. Adamik; Ilya Perlov; Dan Maydan


Archive | 1988

CVD of silicon oxide using TEOS decomposition and in-situ planarization process

David Nin-Kou Wang; John M. White; Kam S. Law; Cissy Leung; Salvador P. Umotoy; Kenneth S. Collins; John A. Adamik; Ilya Perlov; Dan Maydan


Archive | 2004

Dual gas faceplate for a showerhead in a semiconductor wafer processing system

Salvador P. Umotoy; Lawrence Chung-Lai Lei; Anh N. Nguyen; Steve H. Chiao; Hanh D. Nguyen


Archive | 1988

Process for PECVD of silicon oxide using TEOS decomposition

David Nin-Kou Wang; John M. White; Kam S. Law; Cissy Leung; Salvador P. Umotoy; Kenneth S. Collins; John A. Adamik; Ilya Perlov; Dan Maydan


Archive | 2000

One-piece dual gas faceplate for a showerhead in a semiconductor wafer processing system

Salvador P. Umotoy; Lawrence C. Lei; Anh N. Nguyen; Steve H. Chiao


Archive | 2001

Lid assembly for a processing system to facilitate sequential deposition techniques

Gwo-Chuan Tzu; Salvador P. Umotoy


Archive | 1991

Plasma-enhanced CVD process using TEOS for depositing silicon oxide

David Nin-Kou Wang; John M. White; Kam S. Law; Cissy Leung; Salvador P. Umotoy; Kenneth S. Collins; John A. Adamik; Ilya Perlov; Dan Maydan


Archive | 2003

Apparatus for cyclical deposition of thin films

Randhir Thakur; Alfred Mak; Ming Xi; Walter Benjamin Glenn; Ahmad A. Khan; Ayad Al-Shaikh; Avgerinos V. Gelatos; Salvador P. Umotoy


Archive | 1998

High temperature chemical vapor deposition chamber

Salvador P. Umotoy; Steve H. Chiao; Anh N. Nguyen; Be Van Vo; Joel M. Huston; James Jin-Long Chen; Lawrence Chung-Lai Lei


Archive | 2002

Showerhead assembly for a processing chamber

Mark M. Hytros; Truc T. Tran; Hongbee Teoh; Lawrence Chung-Lai Lei; Avgerinos V. Gelatos; Salvador P. Umotoy

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