Imad Yousif | Researchain

Archive Network Publication Hotspot Collaboration

Network

Latest external collaboration on country level. Dive into details by clicking on the dots.

Explore More

Hotspot

Dive into the research topics where Imad Yousif is active.

Explore More

Publication

Featured researches published by Imad Yousif.

Archive | 2009

Method and apparatus for removing polymer from a substrate

Ying Rui; Imad Yousif; Daniel J. Hoffman

Archive | 2012

ABATEMENT AND STRIP PROCESS CHAMBER IN A DUAL LOADLOCK CONFIGURATION

Jared Ahmad Lee; Martin Jeffrey Salinas; Paul B. Reuter; Imad Yousif; Aniruddha Pal

Archive | 1998

Method and apparatus for optical detection of effluent composition

Thomas Nowak; Sebastien Raoux; Dave Silvetti; Stefan Wolff; Russ Newman; Imad Yousif; Ned Matthew

Archive | 2007

Process for wafer backside polymer removal and wafer front side photoresist removal

Kenneth S. Collins; Hiroji Hanawa; Andrew Nguyen; Shahid Rauf; Ajit Balakrishna; Valentin N. Todorow; Kartik Ramaswamy; Martin Jeffrey Salinas; Imad Yousif; Walter R. Merry; Ying Rui; Michael R. Rice

Archive | 2007

Reactor for wafer backside polymer removal using plasma products in a lower process zone and purge gases in an upper process zone

Kenneth S. Collins; Hiroji Hanawa; Andrew Nguyen; Ajit Balakrishna; David Palagashvili; James P. Cruse; Jennifer Y. Sun; Valentin N. Todorow; Shahid Rauf; Kartik Ramaswamy; Gerhard Schneider; Imad Yousif; Martin Jeffrey Salinas

Archive | 2007

Method and apparatus for removing polymer from the wafer backside and edge

Imad Yousif; Anchel Sheyner; Ajit Balakrishna; Nancy Fung; Ying Rui; Martin Jeffrey Salinas; Walter R. Merry; Shahid Rauf

Archive | 2007

Temperature-switched process for wafer backside polymer removal and front side photoresist strip

Archive | 2006

MAGNETIC CONFINEMENT OF A PLASMA

Steven Shannon; Masao Drexel; James A. Stinnett; Ying Rui; Ying Xiao; Roger Alan Lindley; Imad Yousif

Archive | 2010

PLASMA REACTOR WITH TILTABLE OVERHEAD RF INDUCTIVE SOURCE

Kenneth S. Collins; Andrew Nguyen; Martin Jeffrey Salinas; Imad Yousif; Ming Xu

Archive | 2007

Process for wafer backside polymer removal with a ring of plasma under the wafer

Kenneth S. Collins; Hiroji Hanawa; Andrew Nguyen; Ajit Balakrishna; David Palagashvili; James P. Cruse; Jennifer Y. Sun; Valentin N. Todorov; Shahid Rauf; Kartik Ramaswamy; Gerhard Schneider; Imad Yousif; Martin Jeffrey Salinas

Explore More