Martin Jeffrey Salinas

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Archive | 2012

ABATEMENT AND STRIP PROCESS CHAMBER IN A DUAL LOADLOCK CONFIGURATION

Jared Ahmad Lee; Martin Jeffrey Salinas; Paul B. Reuter; Imad Yousif; Aniruddha Pal

Archive | 2007

Process for wafer backside polymer removal and wafer front side photoresist removal

Kenneth S. Collins; Hiroji Hanawa; Andrew Nguyen; Shahid Rauf; Ajit Balakrishna; Valentin N. Todorow; Kartik Ramaswamy; Martin Jeffrey Salinas; Imad Yousif; Walter R. Merry; Ying Rui; Michael R. Rice

Archive | 2007

Reactor for wafer backside polymer removal using plasma products in a lower process zone and purge gases in an upper process zone

Kenneth S. Collins; Hiroji Hanawa; Andrew Nguyen; Ajit Balakrishna; David Palagashvili; James P. Cruse; Jennifer Y. Sun; Valentin N. Todorow; Shahid Rauf; Kartik Ramaswamy; Gerhard Schneider; Imad Yousif; Martin Jeffrey Salinas

Archive | 2007

Method and apparatus for removing polymer from the wafer backside and edge

Imad Yousif; Anchel Sheyner; Ajit Balakrishna; Nancy Fung; Ying Rui; Martin Jeffrey Salinas; Walter R. Merry; Shahid Rauf

Archive | 2007

Temperature-switched process for wafer backside polymer removal and front side photoresist strip

Archive | 2010

PLASMA REACTOR WITH TILTABLE OVERHEAD RF INDUCTIVE SOURCE

Kenneth S. Collins; Andrew Nguyen; Martin Jeffrey Salinas; Imad Yousif; Ming Xu

Archive | 2007

Process for wafer backside polymer removal with a ring of plasma under the wafer

Kenneth S. Collins; Hiroji Hanawa; Andrew Nguyen; Ajit Balakrishna; David Palagashvili; James P. Cruse; Jennifer Y. Sun; Valentin N. Todorov; Shahid Rauf; Kartik Ramaswamy; Gerhard Schneider; Imad Yousif; Martin Jeffrey Salinas

Archive | 2008

Process for wafer backside polymer removal with wafer front side gas purge

Kenneth S. Collins; Hirojii Hanawa; Andrew Nguyen; Ajit Balakrishna; David Palagashvili; James P. Cruse; Jennifer Y. Sun; Valentin N. Todorow; Shahid Rauf; Kartik Ramaswamy; Gerhard Schneider; Imad Yousif; Martin Jeffrey Salinas

Archive | 2012