Keum-Joo Lee

Shallow trench isolation type semiconductor device and method of forming the same

Methods of forming trench isolation regions having recess-inhibiting layers therein that protect against overetching

Trench isolation regions having recess-inhibiting layers therein that protect against overetching

Method of cleaning a semiconductor device and method of manufacturing a semiconductor device using the same

Wafer spin drying apparatus with a plurality of supply nozzles and methods for using the same

Methods of forming a silicon oxide layer and methods of forming an isolation layer

Methods for manufacturing semiconductor devices having chamfered metal silicide layers

Method of manufacturing a capacitor and method of manufacturing a semiconductor device using the same

Methods of fabricating recessed channel metal oxide semiconductor (MOS) transistors

Method of removing a photoresist pattern, method of forming a dual polysilicon layer using the removing method and method of manufacturing a semiconductor device using the removing