Ingemar Carlsson | Researchain

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Featured researches published by Ingemar Carlsson.

Archive | 2008

Endpoint control of multiple-wafer chemical mechanical polishing

Jimin Zhang; Thomas H. Osterheld; Ingemar Carlsson; Boguslaw A. Swedek; Stephen Jew

Archive | 2004

Determination of position of sensor measurements during polishing

Jeffrey Drue David; Nils Johansson; Manoocher Birang; Boguslaw A. Swedek; Ingemar Carlsson

Archive | 2008

Determining Physical Property of Substrate

Abraham Ravid; Boguslaw A. Swedek; Jeffrey Drue David; Jun Qian; Ingemar Carlsson; Dominic J. Benvegnu; Harry Q. Lee; Lakshmanan Karuppiah

Archive | 2008

Methods and apparatus for generating a library of spectra

Abraham Ravid; Boguslaw A. Swedek; Dominic J. Benvegnu; Jeffrey Drue David; Jun Qian; Sidney P. Huey; Ingemar Carlsson; Lakshmanan Karuppiah; Harry Q. Lee

Archive | 2008

HIGH THROUGHPUT MEASUREMENT SYSTEM

Abraham Ravid; Boguslaw A. Swedek; Dominic J. Benvegnu; Jeffrey Drue David; Jun Qian; Sidney P. Huey; Ingemar Carlsson; Lakshmanan Karuppiah; Harry Q. Lee

Archive | 2009

Eddy current sensor with enhanced edge resolution

Hassan G. Iravani; Ingemar Carlsson; Boguslaw A. Swedek

Archive | 2010

Control of overpolishing of multiple substrates on the same platen in chemical mechanical polishing

Jimin Zhang; Ingemar Carlsson; Stephen Jew; Boguslaw A. Swedek

Archive | 2011

Endpoint control of multiple substrates of varying thickness on the same platen in chemical mechanical polishing

Alain Duboust; Stephen Jew; David H. Mai; Huyen T. Tran; Wen-Chiang Tu; Shih-Haur Shen; Jimin Zhang; Ingemar Carlsson; Boguslaw A. Swedek; Zhihong Wang

Archive | 2011

Feedback Control of Polishing Using Optical Detection of Clearance

Kun Xu; Ingemar Carlsson; Feng Q. Liu; David Maxwell Gage; You Wang; Dominic J. Benvegnu; Boguslaw A. Swedek; Yuchun Wang; Pierre Fontarensky; Wen-Chiang Tu; Lakshmanan Karuppiah

Archive | 2011