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Jeanne-Tania Sucharitaves

IBM

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electronic components and technology conference | 2007

Pattern Density Methodology Using IBM Foundry Technologies

David Scagnelli; Casey J. Grant; Keith M. Carrig; Tim Kemerer; Howard S. Landis; Tom McDevitt; Jeanne-Tania Sucharitaves; Esther Tsai; Mukesh Kumar; Paul W. Pastel

An overview of important pattern density requirements and tradeoffs for advanced RF, analog and digital technologies is presented. This paper reviews process sensitivities to pattern density, the advantage of pattern density compliant designs, performance and modeling considerations, and presents methods of detecting and enhancing pattern density deficiencies to improve overall manufacturability.

Archive | 2006

System and method of automated wire and via layout optimization description

Bette L. Bergman Reuter; Howard S. Landis; Anthony K. Stamper; Jeanne-Tania Sucharitaves

Archive | 2005

Aligned dummy metal fill and hole shapes

Howard S. Landis; Jeanne-Tania Sucharitaves

Archive | 2006

Structure and method for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks

Thomas B. Faure; Howard S. Landis; Jeanne-Tania Sucharitaves

Archive | 2010

Formation of masks/reticles having dummy features

Amit Kumar; Howard S. Landis; Jeanne-Tania Sucharitaves

Archive | 2008

Ic chip and design structure including stitched circuitry region boundary identification

Robert K. Leidy; Kevin N. Ogg; Richard J. Rassel; Jeanne-Tania Sucharitaves

Archive | 2008

Stitched circuitry region boundary identification for stitched IC chip layout

Robert K. Leidy; Kevin N. Ogg; Richard J. Rassel; Jeanne-Tania Sucharitaves

Archive | 2007

STRUCTURE AND METHOD FOR SUB-RESOLUTION DUMMY CLEAR SHAPES FOR IMPROVED GATE DIMENSIONAL CONTROL

Howard S. Landis; David P. Parker; Jeanne-Tania Sucharitaves

Archive | 2005

CURRENT-ALIGNED AUTO-GENERATED NON-EQUIAXIAL HOLE SHAPE FOR WIRING

Howard S. Landis; David P. Parker; Jeanne-Tania Sucharitaves

Archive | 2007

DESIGN STRUCTURE FOR PARTITIONED DUMMY FILL SHAPES FOR REDUCED MASK BIAS WITH ALTERNATING PHASE SHIFT MASKS

Thomas B. Faure; Howard S. Landis; Jeanne-Tania Sucharitaves

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Howard S. Landis

IBM

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Amit Kumar

IBM

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David P. Parker

IBM

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Kevin N. Ogg

IBM

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Richard J. Rassel

IBM

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Robert K. Leidy

IBM

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Thomas B. Faure

IBM

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Amanda L. Tessier

IBM

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Anthony K. Stamper

IBM

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Bette L. Bergman Reuter

IBM

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