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友洋 岩野

Hitachi

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Publication

Featured researches published by 友洋 岩野.

Archive | 2011

ABRASIVE, CONCENTRATED 1-LIQUID SYSTEM ABRASIVE, 2-LIQUID SYSTEM ABRASIVE, AND SUBSTRATE POLISHING METHOD

Yosuke Hoshi; Tomohiro Iwano; Takenori Narita; Daisuke Ryuzaki; 友洋 岩野; 武憲 成田; 陽介 星; 大介 龍崎

Archive | 2013

Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate

Tomohiro Iwano; 友洋 岩野; Hisataka Minami; 久貴 南; Toshiaki Akutsu; 利明 阿久津; Koji Fujisaki; 耕司 藤崎

Archive | 2014

Slurry, polishing liquid set, polishing liquid, and method for polishing substrate by using the slurry, the set, and the liquid

友洋 岩野; Tomohiro Iwano; 啓孝 秋元; Hirotaka Akimoto; 成田 武憲; Takenori Narita; 武憲 成田; 忠広 木村; Tadahiro Kimura; 龍崎 大介; Daisuke Ryuzaki; 大介 龍崎

Archive | 2014

Abrasive, abrasive set, and method for polishing substrate

久貴 南; 友洋 岩野; 利明 阿久津

Archive | 2013

砥粒、スラリー、研磨液及びこれらの製造方法

友洋 岩野; 久貴 南; 利明 阿久津; 耕司 藤崎

Archive | 2013

Slurry, polishing liquid set, the polishing method of polishing liquid and the substrate

友洋 岩野; 久貴 南; 利明 阿久津; 耕司 藤崎

Archive | 2013

The method of manufacturing abrasive grains, method for producing a slurry of a manufacturing method and a polishing liquid

友洋 岩野; 久貴 南; 利明 阿久津; 耕司 藤崎

Archive | 2013

スラリー、研磨液セット、研磨液、基板の研磨方法及び基板

友洋 岩野; 久貴 南; 利明 阿久津; 耕司 藤崎

Archive | 2012

Ｃｍｐ研磨液及びその製造方法、複合粒子の製造方法、並びに基体の研磨方法

Hisataka Minami; 久貴 南; Keisuke Inoue; 井上 恵介; Chisato Kikkawa; 知里 吉川; Yutaka Nomura; 野村 豊; Tomohiro Iwano; 友洋 岩野

Archive | 2011

スラリ、研磨液セット、研磨液及びこれらを用いた基板の研磨方法

Tomohiro Iwano; 友洋 岩野; Hirotaka Akimoto; 啓孝 秋元; Takenori Narita; 成田 武憲; Tadahiro Kimura; 忠広 木村; Daisuke Ryuzaki; 龍崎 大介

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久貴 南

Hitachi

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Tomohiro Iwano

Hitachi

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Daisuke Ryuzaki

Hitachi

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Takenori Narita

Asahi Glass Co.

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Hisataka Minami

Hitachi

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Chisato Kikkawa

Hitachi

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Keisuke Inoue

Hitachi

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Koji Fujisaki

Hitachi

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Toshiaki Akutsu

Hitachi

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Yutaka Nomura

Hitachi

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