Johannes Enslin

High-power UV-B LEDs with long lifetime

UV light emitters in the UV-B spectral range between 280 nm and 320 nm are of great interest for applications such as phototherapy, gas sensing, plant growth lighting, and UV curing. In this paper we present high power UV-B LEDs grown by MOVPE on sapphire substrates. By optimizing the heterostructure design, growth parameters and processing technologies, significant progress was achieved with respect to internal efficiency, injection efficiency and light extraction. LED chips emitting at 310 nm with maximum output powers of up to 18 mW have been realized. Lifetime measurements show approximately 20% decrease in emission power after 1,000 operating hours at 100 mA and 5 mW output power and less than 30% after 3,500 hours of operation, thus indicating an L50 lifetime beyond 10,000 hours.

Defect-Related Degradation of AlGaN-Based UV-B LEDs

This paper describes an extensive analysis of the degradation of (InAlGa)N-based UV-B light-emitting diodes (LEDs) submitted to constant current stress. This paper is based on combined electrical characterization, spectral analysis of the emission, deep-level transient spectroscopy (DLTS) and photocurrent (PC) spectroscopy. The results of this analysis demonstrate that: 1) UV-B LEDs show a gradual degradation when submitted to constant current stress; the decrease in optical power is stronger for low measuring current levels, indicating that degradation is related to the increase in Shockley-Read-Hall (SRH) recombination; 2) the current-voltage characteristics measured before/during stress show an increase in the current below the turn-on voltage, that is ascribed to the increase in trap-assisted tunneling (TAT) components; and 3) DLTS analysis and PC spectroscopy measurements were carried out to identify the properties of the defects responsible for the degradation of the optical and electrical characteristics. The results indicate that stress induces or activates defects centered around 2.5 eV below the conduction band edge. These defects, close to midgap, can explain both the increased SRH recombination and the increase in TAT components detected after stress. Moreover, the DLTS measurements allowed to identify the signature of Mg-related acceptor traps.

V-pit to truncated pyramid transition in AlGaN-based heterostructures

The formation of three-dimensional truncated pyramids after the deposition of AlN/GaN superlattices onto (0001) AlN/sapphire templates has been analysed by atomic force microscopy as well as transmission electron microscopy. V-pits in AlN layers and the formation of nano-mounds around the v-pit edges are suggested to be responsible for the pyramid formation. Keeping the individual AlN layer thickness at 2.5 nm in the 80xAlN/GaN superlattice, the transformation to the three-dimensional pyramids is observed when the individual GaN layer thickness exceeds 1.5 nm. A subsequent overgrowth of the pyramidal structures by AlGaN results in inhomogeneous Ga distribution in the layers and laterally inhomogeneous strain states. Nevertheless, compared to the growth on planar layers, the overgrowth of the truncated pyramids leads to a slight reduction in dislocation density from 1 1010 cm−2 (for GaN thickness of 1 nm in SL) to 7 109 cm−2 (for GaN thickness of 2 nm in SL). The non-planar growth front and thus the compositional inhomogeneity in AlGaN vanish gradually with increasing AlGaN thickness. As a result, homogeneous 4 μm thick Al0.5Ga0.5N buffer layers suitable for the fabrication of UV-B LED structures can be obtained.

Defect-generation and diffusion in (In)AlGaN-based UV-B LEDs submitted to constant current stress

The aim of this work is to analyze the degradation in (In)AlGaN-based UV-B LEDs, with a nominal emission wavelength of 310 nm, submitted to constant current stress at a high current density of 350 A/cm2. We observed two main degradation mechanisms that were studied by investigating the evolution of the main emission peak from the quantum well (QW) and of a parasitic peak centered at 340 nm. In the first 50 hours of stress the main peak decreases and the parasitic peak (probably related to radiative recombination in the quantum barrier next to the electron blocking layer) increases at drive currents between 5 mA and 50 mA. Secondly, after 50 hours of stress both the main and the parasitic peak decrease. The first degradation mode could be related to carrier escape from the QWs, since the increase in the parasitic peak is correlated with the decrease in the main peak. After 50 hours of stress, we observed that the current below the turn-on voltage at V = 2 V increases with a square-root of time dependence. This behavior indicates the presence of a diffusion process, probably by point defects causing an increase of non-radiative recombination in the LED.

Degradation effects of the active region in UV-C light-emitting diodes

An extensive analysis of the degradation characteristics of AlGaN-based ultraviolet light-emitting diodes emitting around 265 nm is presented. The optical power of LEDs stressed at a constant dc current of 100 mA (current density = 67 A/cm2 and heatsink temperature = 20 °C) decreased to about 58% of its initial value after 250 h of operation. The origin of this degradation effect has been studied using capacitance-voltage and photocurrent spectroscopy measurements conducted before and after aging. The overall device capacitance decreased, which indicates a reduction of the net charges within the space-charge region of the pn-junction during operation. In parallel, the photocurrent at excitation energies between 3.8 eV and 4.5 eV and the photocurrent induced by band-to-band absorption in the quantum barriers at 5.25 eV increased during operation. The latter effect can be explained by a reduction of the donor concentration in the active region of the device. This effect could be attributed to the compensation of donors by the activation or diffusion of acceptors, such as magnesium dopants or group-III vacancies, in the pn-junction space-charge region. The results are consistent with the observed reduction in optical power since deep level acceptors can also act as non-radiative recombination centers.

Gas Sensing of Nitrogen Oxide Utilizing Spectrally Pure Deep UV LEDs

In this paper, we will present the development of a compact LED-based optical gas sensing system in the ultraviolet-C spectral region. This includes the design of the LED heterostructure emitting near 226 nm, the development of an LED chip, and the implementation into a gas sensing system capable of detecting nitrogen oxide concentrations in the ppm range.

Localization of current-induced degradation effects in (InAlGa)N-based UV-B LEDs

The degradation behavior of ultraviolet-B light emitting diodes (UV-B LEDs) emitting near 310 nm has been investigated and a method to localize the degradation effects is presented. Measurements of the electro-optical characteristics of UV-B LEDs, during a 200 h constant-current degradation study, showed an initial fast decrease in the optical power accompanied by a decrease in the drive voltage and an increase in the capacitance. Furthermore, by using a specially designed contact geometry, it was possible to separate the degradation of the electrical properties of the p-layers and p-contacts from the degradation of the active region and n-side of the LED heterostructure. Our investigations show that the initial changes in capacitance and voltage can be attributed to changes in the p-side and at the p-contact of the LED, which can be explained by an activation of Mg dopants.The degradation behavior of ultraviolet-B light emitting diodes (UV-B LEDs) emitting near 310 nm has been investigated and a method to localize the degradation effects is presented. Measurements of the electro-optical characteristics of UV-B LEDs, during a 200 h constant-current degradation study, showed an initial fast decrease in the optical power accompanied by a decrease in the drive voltage and an increase in the capacitance. Furthermore, by using a specially designed contact geometry, it was possible to separate the degradation of the electrical properties of the p-layers and p-contacts from the degradation of the active region and n-side of the LED heterostructure. Our investigations show that the initial changes in capacitance and voltage can be attributed to changes in the p-side and at the p-contact of the LED, which can be explained by an activation of Mg dopants.

Improved light extraction and quantum efficiencies for UVB LEDs with UV-transparent p-AlGaN superlattices (Conference Presentation)

Light emitting diodes (LEDs) in the UVB (280 nm – 315 nm) spectral range are of particular interest for applications such as plant growth lighting or phototherapy. In fact, LEDs offer numerous advantages compared to conventional ultraviolet light sources such as a tunable emission wavelength, a small form factor, and a minimal environmental impact. State-of-the-art devices utilize p-GaN and low aluminum mole fraction p-AlGaN layers to enable good ohmic contacts and low series resistances. However, these layers are also not transparent to UVB light thus limiting the light extraction efficiency (LEE). The exploitation of UV-transparent p-AlGaN layers together with high reflective metal contacts may significantly increase the LEE. In this paper, the output power of LEDs emitting at 310 nm with a UV-transparent and absorbing Mg-doped AlGaN superlattice is compared. A three-fold increase of the output power was observed for LEDs with UV-transparent p-AlGaN layers. To investigate these findings, LEDs with low reflective Ni/Au and high reflective Al contacts are fabricated and characterized. Together with ray tracing simulations and detailed measurements of the metal reflectivities, we were able to determine the LEE and the internal quantum efficiency (IQE). According to on-wafer measurements, the external quantum efficiency (EQE) increases from 0.3% for an absorbing p-Al0.2Ga0.8N/Al0.4Ga0.6N-superlattice with Ni/Au contacts to 0.9% for a UV-transparent p-Al0.4Ga0.6N/Al0.6Ga0.4N-superlattice with Al contacts. This 3× enhancement of the EQE can be partially ascribed to an improved LEE (from 4.5% to 7.5%) in combination with a 1.8× increase of the IQE when using a p-Al0.4Ga0.6N/Al0.6Ga0.4N-superlattice instead of a p-Al0.2Ga0.8N/Al0.4Ga0.6N-superlattice.

Highly Reflective p-Contacts Made of Pd-Al on Deep Ultraviolet Light-Emitting Diodes

Highly reflective metal contacts for the p-layers of AlGaN-based deep ultraviolet light emitting diodes (DUV LEDs) emitting at 305 nm have been investigated. Different Pd-Al metal stacks have been examined and a reflectivity of 82% was obtained after annealing, which is about two times the value measured for conventional Pd contacts. The high reflectivity is attributed to the formation of an Al4Pd phase besides an Al phase in the annealed contact. DUV LEDs with highly-reflective Pd-Al contacts exhibited an increase of the light output power by 30% at a dc current of 20 mA.

Influence of the LED heterostructure on the degradation behavior of (InAlGa)N-based UV-B LEDs

In this paper we report on the influence of the heterostructure design of (InAlGa)N-based UV-B LEDs grown by metalorganic vapor phase epitaxy on sapphire substrates on the degradation behavior of the device. Two types of LEDs with different heterostructure design, resulting in peak-wavelengths of about 290 nm and 310 nm, respectively, were stressed at a constant operation current of 100 mA and a heat sink temperature of 20°C. Electro-optical characterization of the LEDs over 1.000 h of operation shows two different degradation modes with respect to the change of the emission spectrum and leakage current. The first mode during the initial hours (290 nm LED: 0 h - 500 h, 310 nm LED: 0 h – 100 h) of operation is represented by a fast reduction of the quantum well (QW) luminescence, a constant or increasing parasitic luminescence between 310 nm and 450 nm and a fast increase of the reverse- and forward-bias leakage current. These changes are more pronounced (higher degradation rate) in the 290 nm LEDs and can therefore be attributed to the different heterostructure design. In contrast, the second degradation mode at longer operation times (290 nm LED: >500 h, 310 nm LED: >100 h) is marked by a slow reduction of both the QW and the parasitic luminescence, as well as a slow increase of the leakage current which are similar for both types of LEDs. Furthermore, the second mode is marked by a square-root time dependence of the QW luminescence intensity, indicating a diffusion process to be involved.