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Johnny Widodo

IBM

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Publication

Featured researches published by Johnny Widodo.

Archive | 2007

Methods of Forming Integrated Circuit Devices Having Ion-Cured Electrically Insulating Layers Therein

Jun-Jung Kim; Joo-Chan Kim; Jae-eon Park; Richard A. Conti; Zhao Lun; Johnny Widodo; William C. Wille; Biao Zuo

Archive | 2007

Methods of Forming Integrated Circuit Structures Using Insulator Deposition and Insulator Gap Filling Techniques

Junjung Kim; Ja-hum Ku; Jae-eon Park; Sunfei Fang; Alois Gutmann; O-Sung Kwon; Johnny Widodo; Daewon Yang

Archive | 2007

BEOL INTERCONNECT STRUCTURES WITH IMPROVED RESISTANCE TO STRESS

Darryl D. Restaino; Griselda Bonilla; Christos D. Dimitrakopoulos; Stephen M. Gates; Jae H. Kim; Michael Lane; Xiao H. Liu; Son Van Nguyen; Thomas M. Shaw; Johnny Widodo

Archive | 2007

Method of controlled low-k via etch for Cu interconnections

Wuping Liu; Johnny Widodo; Teck Jung Tang; Jing Hui Li; Han Wah Ng; Larry Clevenger; Hermann Wendt

Archive | 2008

Methods of Forming Metal Interconnect Structures on Semiconductor Substrates Using Oxygen-Removing Plasmas and Interconnect Structures Formed Thereby

Jae Hak Kim; Griselda Bonilla; Steven E. Molis; Darryl D. Restaino; Hosadurga Shobha; Johnny Widodo

Archive | 2007

Methods of Forming Field Effect Transistors Having Stress-Inducing Sidewall Insulating Spacers Thereon and Devices Formed Thereby

Jun-Jung Kim; Sang-Jine Park; Min-Ho Lee; Thomas W. Dyer; Sunfei Fang; O-Sung Kwon; Johnny Widodo

Archive | 2007

INTEGRATED CIRCUIT SYSTEM WITH CARBON ENHANCEMENT

Wuping Liu; Kevin S. Petrarca; Johnny Widodo; Lawrence A. Clevenger; Wai-kin Li

Archive | 2007

Methods of forming field effect transistors having stress-inducing sidewall insulating spacers thereon

Jun-Jung Kim; Sang-Jine Park; Min-Ho Lee; Thomas W. Dyer; Sunfei Fang; O-Sung Kwon; Johnny Widodo

Archive | 2011

Field Effect Transistors Having Gate Electrode Silicide Layers with Reduced Surface Damage

Jun-Jung Kim; Sang-Jine Park; Min-Ho Lee; Thomas W. Dyer; Sunfei Fang; O-Sung Kwon; Johnny Widodo

Archive | 2007

Verfahren zur Behandlung mit ultravioletter (UV) Strahlung für unteratmosphärisches-chemisches Gasphasenabscheiden (SACVD) von Ozon-Tetra-Ethyl-Ortho-Silikat (O3-TEOS) A method of treating with ultraviolet (UV) radiation for subatmospheric-chemical vapor deposition (SACVD) of ozone-tetra-ethyl-ortho-silicate (O3-TEOS)

Alois Gutmann; Roland Hampp; Jun Jung Kim; Jae-Eun Park; Andre Schenk; Johnny Widodo

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Jun-Jung Kim

IBM

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O-Sung Kwon

IBM

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Sunfei Fang

IBM

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Darryl D. Restaino

IBM

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Min-Ho Lee

IBM

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Sang-Jine Park

IBM

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Thomas W. Dyer

IBM

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Griselda Bonilla

IBM

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Jae-eon Park

IBM

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Jun Jung Kim

IBM

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