Johnny Widodo

Methods of Forming Integrated Circuit Devices Having Ion-Cured Electrically Insulating Layers Therein

Methods of Forming Integrated Circuit Structures Using Insulator Deposition and Insulator Gap Filling Techniques

BEOL INTERCONNECT STRUCTURES WITH IMPROVED RESISTANCE TO STRESS

Method of controlled low-k via etch for Cu interconnections

Methods of Forming Metal Interconnect Structures on Semiconductor Substrates Using Oxygen-Removing Plasmas and Interconnect Structures Formed Thereby

Methods of Forming Field Effect Transistors Having Stress-Inducing Sidewall Insulating Spacers Thereon and Devices Formed Thereby

INTEGRATED CIRCUIT SYSTEM WITH CARBON ENHANCEMENT

Methods of forming field effect transistors having stress-inducing sidewall insulating spacers thereon

Field Effect Transistors Having Gate Electrode Silicide Layers with Reduced Surface Damage

Verfahren zur Behandlung mit ultravioletter (UV) Strahlung für unteratmosphärisches-chemisches Gasphasenabscheiden (SACVD) von Ozon-Tetra-Ethyl-Ortho-Silikat (O3-TEOS) A method of treating with ultraviolet (UV) radiation for subatmospheric-chemical vapor deposition (SACVD) of ozone-tetra-ethyl-ortho-silicate (O3-TEOS)