Karen A. Nummy
IBM
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Publication
Featured researches published by Karen A. Nummy.
Ibm Journal of Research and Development | 2011
Subramanian S. Iyer; G. Freeman; Colin J. Brodsky; Anthony I. Chou; D. Corliss; Sameer H. Jain; Naftali E. Lustig; Vincent J. McGahay; Shreesh Narasimha; James P. Norum; Karen A. Nummy; Paul C. Parries; Sujatha Sankaran; Christopher D. Sheraw; P. R. Varanasi; Geng Wang; M. E. Weybright; Xiulan Yu; E.F. Crabbe; Paul D. Agnello
The 45-nm technology, called 12S and developed for IBM POWER7®, is an extremely robust and versatile technology platform that allows for a rich set of features that include embedded dynamic random access memory (DRAM), performance and dense static RAM (SRAM), a trench-based decoupling capacitor, a comprehensive device menu, and a high-performance hierarchical back-end interconnect scheme, all built on a silicon-on-insulator (SOI) substrate. Embedded DRAM was implemented for production in high-performance SOI for the first time and allowed us to leapfrog two generations of conventional SRAM densities. Immersion lithography was also employed for the first time in 45-nm IBM products. Our 45-nm design point represents a judicious leverage of silicon oxynitride dielectrics, scaled device technology, and rich features to yield chip-level performance enhancement of more than 50%, compared with our 65-nm node at comparable or less power. This paper describes the salient features of this technology node, the process architecture, the device design rationale, and the process design interactions.
advanced semiconductor manufacturing conference | 2015
Bradley Morgenfeld; Timothy A. Brunner; Karen A. Nummy; Derek C. Stoll; Nan Jing; Hong Lin; Pradeep Vukkadala; Pedro Herrera; Roshita Ramkhalawon; Jaydeep K. Sinha
Reducing focus errors during optical lithography patterning is crucial for minimizing defects and for achieving the desired critical dimension uniformity (CDU). Factors that contribute to lithography defocus originate from both within and outside the exposure tools. Wafer geometry and topography have been shown to be a major contributor to the focus budget, but decoupling wafer issues from scanner tooling / chuck signatures is far from trivial. In this paper we will review how the use of flatness metrology in a 22nm manufacturing environment improved our ability to measure focus errors as well as enabled the decoupling of error between tooling and wafer sources. We will also review several examples of experimental datasets demonstrating how this wafer shape measurement technique has provided unique insight to the nature of topography based focus error, as well as provide a valuable learning mechanism for driving improvement in process cycles of learning.
Archive | 2007
Seong-Dong Kim; Bin (Frank) Yang; Shreesh Narasimha; Andrew Waite; Karen A. Nummy; Linda Black; Haizhou Yin; Scott Luning
A comprehensive technique for the accurate extraction of the effective lateral doping abruptness and the spreading resistance components is applied to both Si (100) and Si (110) MOSFETs. The spreading resistance components under extension-to-gate overlap and spacer regions are successfully correlated to the lateral extension (EXT) doping abruptness by the relationship between on-resistance (Ron) and overlap capacitance response (Cov). The lateral doping profile difference is extracted between (100) and (110) PMOS, which successfully explains higher external resistance in measured (110) PMOS.
Archive | 1986
Klaus Dietrich Beyer; James Steve Makris; Eric Mendel; Karen A. Nummy; Seiki Ogura; Jacob Riseman; Nivo Rovedo
Archive | 1989
Jeffrey L. Blouse; Inge Grumm Fulton; Russell C. Lange; Bernard S. Meyerson; Karen A. Nummy; Martin Revitz; Robert Rosenberg
Archive | 1991
Jeffrey L. Blouse; Inge Grumm Fulton; Russell C. Lange; Bernard S. Meyerson; Karen A. Nummy; Martin Revitz; Robert Rosenberg
Microelectronic Engineering | 2015
Nicolas L. Breil; Christian Lavoie; Ahmet S. Ozcan; Frieder H. Baumann; Nancy Klymko; Karen A. Nummy; Bing Sun; Jean Jordan-Sweet; Jian Yu; Frank Zhu; Shreesh Narasimha; Michael P. Chudzik
Archive | 2009
Anthony G. Domenicucci; Terence Kane; Shreesh Narasimha; Karen A. Nummy; Viorel Ontalus; Yun-Yu Wang
Archive | 2015
Herbert L. Ho; Naoyoshi Kusaba; Karen A. Nummy; Carl J. Radens; Ravi M. Todi; Geng Wang
Archive | 2012
Joseph Ervin; Brian W. Messenger; Karen A. Nummy; Ravi M. Todi