Klaus F. Schuegraf

Effects of temperature and defects on breakdown lifetime of thin SiO/sub 2/ at very low voltages

Shallow trench isolation using low dielectric constant insulator

Semiconductor processing method of providing a conductively doped layer of hemispherical grain polysilicon

Uniform dielectric film deposition on textured surfaces

Semiconductor processing method of forming a tantalum oxide containing capacitor

Rugged metal electrodes for metal-insulator-metal capacitors

Methods for forming wordlines, transistor gates, and conductive interconnects, and wordline, transistor gate, and conductive interconnect structures

DRAM capacitors made from silicon-germanium and electrode-limited conduction dielectric films

High pressure reoxidation anneal of silicon nitride for reduced thermal budget silicon processing

Method of monitoring a process of manufacturing a semiconductor wafer including hemispherical grain polysilicon