Klaus Penner

Control of gas content in process liquids for improved megasonic cleaning of semiconductor wafers and microelectronics substrates

Fabrication of trench capacitors using disposable hard mask

Trench etching using borosilicate glass mask

Cleaning of semiconductor wafers and microelectronics substrates

Method of end point detection using a sinusoidal interference signal for a wet etch process

Method of end point detection for a wet etch process

Method for end-point detection of wet etching process

High etch selectivity etchant for doped silicate glass

Procédé pour la détection du point final dans un traitement de gravure mouillé

Reinigen von Halbleiterscheiben und Mikroelektronik-Substraten Cleaning of semiconductor wafers and microelectronics substrates